Waferpedia

Tegal

901G

Tegal901G
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Wafer size

75 mm to 150 mm round substrates; square and rectangular substrates

Introduced

1999

What is it?

The Tegal 901G is described as a diode plasma etcher specially configured for GaAs processing. Sources state that it was used for etching high-performance devices on gallium arsenide substrates for wireless applications, and that the broader 901 platform is intended for applications including pad, zero layer, non-selective nitride, backside, planarization, oxide, nitride, poly, and III-V materials such as GaAs.

What can it run?

Process applications and technology nodes documented for this tool.

  • etching high performance devices on GaAs substrates
  • cellular phones and other wireless communication products
  • GaAs wireless applications

What do the numbers mean?

Wafer handling1

Substrate sizes on platform
75 mm to 150 mm round substrates as well as square and rectangular substrates[2]
Accurate?

Configuration & options4

Tool type
diode plasma etcher[1]
Accurate?
special configuration for GaAs processing[1]
Accurate?
Configured features
special sensors and electrode designs[2]
Accurate?
Intended applications on platform
pad, zero layer, non-selective nitride, backside, planarization, oxide, nitride, poly, and III-V materials applications such as GaAs[2]
Accurate?
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the 901G are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 901G are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 901G are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 901G are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 901G are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 901G is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.orgweb.archive.org
  3. [3]Tegal - Thin Film Manufacturing Equipment, Etch, Ferroelectrics Etch, Platinum Etch, Oxide Etch, Nitride Etch, Dry Etch, Plasma Etchweb.archive.orgweb.archive.org
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Last updated Jul 29, 2026.

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