Tokyo Electron

Alpha 8 SE

Thermal / Diffusion Wafer I Cassette HandlingProduced 2003–Tokyo Electron Alpha family

Research Quality: 60% complete

The Tel Alpha 8 SE is an 8-inch thermal/diffusion furnace. The Alpha 8 SE supports processes including high-temperature oxide, undoped poly, and D-poly. The Alpha 8 SE operates on 100 V AC power with a maximum full-load current of 40 A.^[1]^[2]^[3]^[4]

Alpha 8 SE — Inventory photo — Fig. 01Alpha 8 SEInventory photo^[1]

Wafer size

Wafer I Cassette Handling

Produced

2003–

Power

50/60 HZ^[1]

Vacuum

Atmospheric

Gas delivery

WAVES

What it is

General reference — not yet source-verified

A diffusion furnace is a wafer batch thermal processing tool used to heat wafers in a controlled process tube while gases flow through the hot zone. Diffusion furnaces are used in front end semiconductor manufacturing for film growth, dopant introduction, and high temperature anneal style steps.

Where it fits in the process flow

General reference — not yet source-verified

Diffusion furnaces are used during front end wafer fabrication after incoming wafer preparation and cleaning, and before later lithography, etch, implant, deposition, or contact formation steps that depend on the resulting thermal layer or doped region. Furnace steps are commonly integrated with preclean and postprocess inspection because surface condition strongly affects oxide growth, poly deposition behavior, and dopant results.

Applications

General reference — not yet source-verified

Furnaces in this class are applied to thermal oxidation, polysilicon related thermal steps, and dopant diffusion style processes used to build electrically functional layers and regions in semiconductor devices. Such tools are used when a process flow requires batch thermal treatment with stable ambient control rather than single wafer rapid heating.

High temperature oxide
Undoped poly
D-Poly

What do the numbers mean?

Power & electrical9

50/60 HZ^[1]; Single Phase^[1]
Power AC: 100 V^[1]
Voltage: 208 V^[5]
Phase: 3 Phase^[5]
Frequency: 50/60 HZ^[1]
Phase: Single Phase^[1]
Electrical: 50/60 HZ^[1]
Electrical: 4.0 kVA^[1]

Vacuum & pumping1

Process Pressure: Atmospheric(inventory listing)

Wafer handling11

Handler System: Wafer Transfer Robot^[5]
N2 Load Lock: Not Installed(inventory listing)
Wafer size: Wafer I Cassette Handling(inventory listing)
Wafer Size: 8 inch^[2]
Wafer Size: 26 slots(inventory listing)
Wafer Type: Notch(inventory listing)
Stocker: 21 slot Carrier(inventory listing)
Wafer size: Transfer Stage Wafer Position Sensor(inventory listing)
Wafer size: Fork Wafer Present Sensor(inventory listing)
Wafer size: Fork Wafer Position Sensor OEM Model Description(inventory listing)
Wafer sizes: 8 inch^[2]

Gas & chemistry2

Gas Controller: WAVES(inventory listing)
Gas Flow Chart Panel: Installed (Front, Rear)(inventory listing)

Optics & imaging1

Furnace Overtemp Detector: FENWAL/DMR-5FR(inventory listing)

Control & software9

Software Version: 3.01 Rev. 003^[5]
Factory Interface: SMIF^[5]
Software Version: 3.01 Rev. 004^[8]
System Main Controller: WAVES(inventory listing)
Mechanical Controller: WAVES(inventory listing)
Sequenc Controller: WAVES(inventory listing)
Furnace Temperature Controller: Model 560A(inventory listing)
Software Version: V07.06(inventory listing)
System Controller: TS-4000Z(inventory listing)

Configuration & options48

Process: High Temp Oxide (HCL, Ar)^[1]
Power: 4.0 kVA^[1]
Maximum Full Load Current: 40 A^[1]
Overcurrent / Shortcircuit: 40 A^[1]; UnDoped Poly^[2]; High Temperature Oxide^[3]
Process: D-Poly^[6]
Process: Undoped Poly^[4]
Process: Hi Temp Oxide, Condition 'A'^[7]
Main System: Well Drive^[5]; Oxide process^[5]
System Layout: Main, Utility(inventory listing)
System Type: L Type(inventory listing)
Side Maintenance: Installed(inventory listing)
System Paint Color: Ivory(inventory listing)
Furnace Front Surface Finish: Ivory(inventory listing)
Heater Model: VMU-40-007EX(1200°C)(inventory listing)
Rapid Cooling Unit: Not Installed(inventory listing)
O2 Analyzer: Not Installed(inventory listing)
SMIF Maker/Model: Not Installed(inventory listing)
AGV Compatibility: Unable(inventory listing)
Operation Panel: Installed (Front, Rear)(inventory listing)
Signal Tower / Colors: Installed (3 COLORS)(inventory listing)
Vintage: 2006(inventory listing)
Vintage: 2003(inventory listing)
Power Consumption: 4.0 kVA^[1]
Vintage: 2002(inventory listing)
Vintage: 2004(inventory listing)
Vintage: 2000(inventory listing)
Vintage: 2001(inventory listing)
Furnaces / Diffusion Vintage: 2006(inventory listing)
Furnaces / Diffusion Vintage: 2003(inventory listing)
Furnaces / Diffusion Vintage: 2002(inventory listing)
Furnaces / Diffusion Vintage: 2004(inventory listing)
Furnaces / Diffusion Vintage: 2000(inventory listing)
Furnaces / Diffusion Vintage: 2001(inventory listing)
Process: Oxide(inventory listing)
Temperature Range: 960°C (max. 1025°C)(inventory listing)
Front Surface Finish: White(inventory listing)
Inner TC Type: In-line(inventory listing)
Tube Seal: Lip Seal(inventory listing)
Vintage: 1997(inventory listing)
Furnaces / Diffusion Vintage: 1997(inventory listing)
Model: Alpha 8 SE^[1]
Make: Tel^[1]
Equipment type: Furnace^[2]
Process: High Temperature Oxide^[3]
Process: High Temp Oxide^[3]

Vintage & configurations

2003Production start^[4]
Vintage 2003 stated for an Alpha 8 SE furnace unit with undoped poly process.
2004Production start^[1]
Vintage 2004 stated for an Alpha 8 SE unit with high-temperature oxide process and for a D-poly process unit.

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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

Bruce BDF 41 Diffusion— Same function class: Thermal / Diffusion, UnknownCompare in depthsource^[1]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Configuration50/60 HZ^[1]
ConfigurationSingle Phase^[1]
Power AC100 V^[1]
Voltage208 V^[5]
Phase3 Phase^[5]
Gas ControllerWAVES
Gas Flow Chart PanelInstalled (Front, Rear)
Frequency50/60 HZ^[1]
PhaseSingle Phase^[1]
Process PressureAtmospheric
Electrical50/60 HZ^[1]
Electrical4.0 kVA^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What thermal processes can the Alpha 8 SE perform?

The Alpha 8 SE can perform high-temperature oxide processing (with HCL and argon), as well as depositing undoped and doped polysilicon.^[1]^[2]^[3]^[6]^[4]

What is the electrical power requirement for the Alpha 8 SE?

The Alpha 8 SE requires a single-phase AC power of 100 V, with a maximum full load current of 40 A and a total power consumption of 4.0 kVA.^[1]

Not publicly documented

The following facts about the Alpha 8 SE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented variants, configuration options, or revision breakpoints of the Alpha 8 SE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Alpha 8 SE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alpha 8 SE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alpha 8 SE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Alpha 8 SE are on record.
Answerable by: an OEM parts catalog or a service engineer