Tokyo Electron
Clean Track Act 12 Resist
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Tel Clean Track Act 12 is a resist coater and developer made by Tel. The Clean Track Act 12 handles 12-inch wafers. The Clean Track Act 12 is available in single-block and multi-block configurations.[1][2][3][4][5]
What it is
How it works
General reference — not yet source-verifiedA resist track prepares wafers for lithography by handling photoresist application and development on a coated wafer surface.
The machine class typically combines spin-based resist coating, controlled bake steps, chemical dispense, and development modules within an integrated track platform.
Where it fits in the process flow
General reference — not yet source-verifiedA resist coater and developer sits in the lithography flow before pattern transfer steps that use an exposure tool and after wafer surface preparation.
A track system supports the photoresist process sequence between incoming bare or prepared wafers and the next lithography operation.
Applications
General reference — not yet source-verifiedResist tracks are used for lithographic process work in device manufacturing where patterned resist defines later etch or implant transfer.
What do the numbers mean?
Wafer handling2
Gas & chemistry1
Configuration & options9
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| 12" Single Block | — | — | — | Equipment inventory listing[1] |
| 12" Multi Block | — | — | — | Equipment inventory listing[3] |
| Clean Track Act 12 Single Block | — | — | Single block configuration | Equipment inventory listing[1] |
| Clean Track Act 12 Multi Block | — | — | Multi block configuration | Equipment inventory listing[3] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Equipment typeResist coater / developer[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Clean Track Act 12 Resist are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Clean Track Act 12 Resist are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Clean Track Act 12 Resist are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Clean Track Act 12 Resist are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Clean Track Act 12 Resist is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Clean Track Act 12 Resist are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]Equipment inventory listing
- [3]inventory listing
- [4]Equipment inventory listing
- [5]Equipment inventory listing
Last updated Oct 12, 2026.
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