Tokyo Electron Clean Track

Models in this family

1. 

   Clean Track Act 12
2. Clean Track Act 12 Resist

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   12" Single Block	—	—	—	Equipment inventory listing[1]
   12" Multi Block	—	—	—	Equipment inventory listing[2]

3. 

   Clean Track Act 8produced 1997–

   Tokyo Electron Clean Track Act 8 is an 8-inch coater/developer track with an interface unit for a Canon FPA-3000 i5 stepper and wafer edge exposure.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   Clean Track Act 8	—	2001	One source lists 2001 Vintage and another lists 2002 Vintage for the same model.	Equipment inventory listing[3]

4. 

   Clean Track Act 8 D

   Tokyo Electron Clean Track Act 8 D is a track system for wet processing in semiconductor manufacturing. Machines of this class handle resist coating, bake, develop, and related wafer cleaning and conditioning steps as part of lithography support.

5. 

   Clean Track Act 8 DUV

   Tokyo Electron Clean Track Act 8 is a DUV clean track system for 8-inch wafers.

6. Clean Track Act 8 Resist

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   8" Single Block	—	—	—	Equipment inventory listing[4]
   8" Multi Block	—	—	—	Equipment inventory listing[5]
   6" Single Block	—	—	—	Equipment inventory listing[6]

7. 

   Clean Track Lithius
8. 

   Clean Track Lithius i+
9. Clean Track Lithius Pro Resist
10. Clean Track Lithius Pro V i Resist
11. Clean Track Lithius Pro V Resist

    The Tokyo Electron Clean Track Lithius Pro V is a resist coater/developer for 12-inch wafers, described as a multi-block system.

12. Clean Track Lithius Pro Z i Resist

    Tokyo Electron Clean Track Lithius Pro Z i Resist is a coater/developer system described as a 12-inch multi block tool.

13. Clean Track Lithius Resist

    Tokyo Electron Clean Track Lithius Resist is a resist-processing wet clean track system used in semiconductor manufacturing. It belongs to the class of automated process tools that handle photoresist-related coating, baking, and cleaning steps around lithography.

14. 

    Clean Track Mark 5

    Tokyo Electron Clean Track Mark 5 coater described as a single coater with 3 pump dispensers, 2 hot plates, 2 cold plates, and one unknown station.

15. Clean Track Mark 7
16. 

    Clean Track Mark 8

    Tokyo Electron Clean Track Mark 8 is a coater/developer system stated to be configured for 8-inch wafers.

17. Clean Track Mark 8 Resist
18. 

    Clean Track Mark 8 Track

Sources