Clean Track Act 8 D

The Tokyo Electron Clean Track Act 8 D is configured for 8 inch wafers. The Tokyo Electron Clean Track Act 8 D includes a CE mark, an AC power box, a T/C unit, T/H Controller 1+2, a chemical cabinet, 4 coater modules, and 4 developer modules.^[1]

Clean track systems of this class move wafers through enclosed stations for dispense, spin, bake, chill, develop, and rinse operations associated with resist processing. A clean track system generally uses robotic wafer handling between modules so that coating and development steps occur in a controlled environment. Coater modules in this class typically apply liquid materials to rotating wafers, while developer modules typically deliver developer chemistry in a timed sequence to form the patterned resist image after exposure.

Clean track systems of this class sit alongside photolithography in the wafer-fabrication flow. A clean track system generally prepares wafers before exposure by coating resist and carrying out temperature-controlled conditioning steps, and then processes wafers after exposure through development and related wet steps. Clean track equipment therefore links wet chemistry handling with the pattern-transfer sequence used in microfabrication.

Clean track systems of this class are used for photoresist coating and development in semiconductor manufacturing. Clean track processing supports pattern definition for layers that will later be etched, implanted, deposited, or otherwise selectively processed. Clean track equipment in clean environments is also used wherever spin-applied lithographic materials and wet development are needed on production wafers.