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Tokyo Electron

Indy B L

Thermal / DiffusionTokyo Electron Indy family
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What it is

General reference — not yet source-verified

A semiconductor diffusion furnace is a thermal processing tool used to expose wafers to controlled heat and process gases. Furnace systems of this class are used for reactions such as film growth, dopant diffusion, and high temperature ambient treatment in batch wafer processing.

How it works

General reference — not yet source-verified

Furnace tools of this class process wafers inside a heated tube or chamber while controlled gases flow through the process zone. Thermal energy and gas chemistry together drive reactions at the wafer surface, allowing the tool to form or modify films and material properties across a batch.

Where it fits in the process flow

General reference — not yet source-verified

Thermal diffusion furnaces sit in the thermal processing portion of semiconductor manufacturing. Such tools are commonly used after wafer cleaning and before later patterning, etch, implant, deposition, or contact formation steps, depending on the purpose of the thermal cycle.

Applications

General reference — not yet source-verified

Furnaces in this equipment class are used for thermal oxidation, dielectric growth, diffusion, annealing, and deposition processes that rely on stable temperature control and controlled ambient chemistry. The exact recipe depends on the process integration target and the gases qualified on the tool.

What do the numbers mean?

Wafer handling1

Wafer Size
12 inch[1]
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Configuration & options18

N2O, NH3, SiH2Cl2, SiH4, PAC module[1]
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DCS Nitride[2]
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D-Poly[3]
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Included HDD[3]
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Vintage
2006[3]
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Vintage
2007[1]
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Vintage
2010[2]
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Processes
N2O, NH3, SiH2Cl2, SiH4, PAC module[1]
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Process
DCS Nitride[2]
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Process
D-Poly, included HDD[3]
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OEM
Tokyo Electron[1]
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Model
Indy B L[1]
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Equipment type
Furnace[1]
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Process configuration
N2O, NH3, SiH2Cl2, SiH4, PAC module[1]
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Process configuration
DCS Nitride[2]
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Process configuration
D-Poly[3]
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Included component
HDD[3]
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Process use
N2O, NH3, SiH2Cl2, SiH4, PAC module[1]
Accurate?
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What type of equipment is the Indy B L?

The Indy B L is a furnace.[1][2][3][4]

Which process chemistries can the Indy B L use?

The Indy B L can use N2O, NH3, SiH2Cl2, SiH4 with a PAC module, as well as DCS Nitride and D-Poly chemistries.[1][2][3]

Not publicly documented

The following facts about the Indy B L are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Indy B L are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Indy B L are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Indy B L are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Indy B L are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Indy B L is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]Equipment inventory listing
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Last updated Oct 19, 2026.

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