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Axcelis

GSD 200 E 2 High Current

Ion ImplantationAxcelis GSD 200 family
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GSD 200 E 2 High Current — Inventory photo
Fig. 01GSD 200 E 2 High CurrentInventory photo[1]

What it is

General reference — not yet source-verified

Ion implanters introduce dopant species into semiconductor wafers by accelerating ions toward the wafer surface under controlled conditions. High current ion implanters are generally used where fabs need relatively high dose implants in production flows.

Where it fits in the process flow

General reference — not yet source-verified

Ion implantation is generally a front-end wafer process used to form electrically active regions by placing dopant atoms into selected areas of the wafer. Ion implantation commonly occurs after patterning steps that define where dopants should enter and before later thermal and integration steps that activate dopants and continue device formation.

Applications

General reference — not yet source-verified

High current ion implanters are generally used for dopant introduction steps in semiconductor device fabrication. Ion implantation is commonly applied where process engineers need controlled placement of electrically active species for regions such as wells, source and drain structures, or contact-related implants.

What do the numbers mean?

Power & electrical3

High Voltage Transformer
both Oil/Light[2]
Accurate?
Options
Accel-Highvoltage Probe installed, HPES-Upgrade installed[2]
Accurate?
Options
Accel-Highvoltage Probe installed; HPES-Upgrade installed, but upgrades were stopped after HPES-Upgrade; Modified Gasbox-Frame for 6L Bottles; Modified Plasma-Gun Power-Supply installed (TDK); Minor modifications on tool (like interlocks)[2]
Accurate?

Wafer handling3

Handler System
Arm (Non HPES), In Air Handler[1]
Accurate?
Wafer Size
8 inch[1]
Accurate?
Wafer Size
6 inch[4]
Accurate?

Control & software6

Software Version
VM 8.0 (Virtual Machine)[1]
Accurate?
Factory Interface
None[1]
Accurate?
Software Version
6.4.3 (no license included)[2]
Accurate?
CIM Interface
SECs[1]
Accurate?
Software Version
6.4.3[2]
Accurate?
Kit Cell Controller
177[2]
Accurate?

Configuration & options24

CIM
SECs[1]
Accurate?
Process
B11, BF2, As, P[1]
Accurate?
Option System
Silicon Disk, SEF EGUN[1]
Accurate?
Blade Server 120006095C Excluded[1]
Accurate?
AsH3, BF3[2]
Accurate?
Refurbished[2]
Accurate?
CE Marked[2]
Accurate?
HPES-Upgrade installed, but upgrades were stopped after HPES-Upgrade[2]
Accurate?
Missing:[2]
Accurate?
Clean-Room Table on frontside - 0.5L Xe-Plasma-Bottle Holder + Terminal Water Cover[2]
Accurate?
Process Species
B11, BF2, As, P[1]
Accurate?
Process Species
AsH3, BF3[2]
Accurate?
Vintage
2001[1]
Accurate?
Vintage
1995[2]
Accurate?
Disk Drive
Direct-Drive[2]
Accurate?
Dose Type
Regular[2]
Accurate?
Source Type
ELS4 IHC-Source without Vaporizer[2]
Accurate?
Main Workstation
SUN Solaris AXI 3HE (special case)[2]
Accurate?
Second Workstation
SUN Sparc5 on cart with printer[2]
Accurate?
Tower Color
red/yellow/green; no buzzer[2]
Accurate?
Network
24-port 100MB Ethernet with Cisco Router[2]
Accurate?
OEM
Axcelis[1]
Accurate?
Model
GSD 200 E 2[1]
Accurate?
Equipment type
High Current Implanter[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
GSD 200 E 2——One source states 8 inch wafer size and lists software, CIM, process, handler, factory interface, and option details; another source states 6 inch wafer size.Equipment inventory listing[1]
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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • High Voltage Transformerboth Oil/Light[2]
  • OptionsAccel-Highvoltage Probe installed, HPES-Upgrade installed[2]
  • OptionsAccel-Highvoltage Probe installed; HPES-Upgrade installed, but upgrades were stopped after HPES-Upgrade; Modified Gasbox-Frame for 6L Bottles; Modified Plasma-Gun Power-Supply installed (TDK); Minor modifications on tool (like interlocks)[2]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

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Frequently asked questions

What dopant species can the GSD 200 E 2 be configured to implant?

The implanter can be configured to implant B11, BF2, As, P, AsH3, and BF3.[1][2]

What type of wafer handler does the GSD 200 E 2 use?

The handler system is an arm-based handler (non HPES) operating in air.[1]

Not publicly documented

The following facts about the GSD 200 E 2 High Current are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the GSD 200 E 2 High Current are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the GSD 200 E 2 High Current are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the GSD 200 E 2 High Current are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the GSD 200 E 2 High Current is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the GSD 200 E 2 High Current are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (7)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Inventory photo
  3. [3]Inventory photo
  4. [4]Equipment inventory listing
  5. [5]Equipment inventory listing
  6. [6]fabsurplus.comfabsurplus.com
  7. [7]Equipment inventory listing
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Last updated Oct 16, 2026.

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