Surfscan 6100 Wafer

Wafer inspection systems are fab metrology tools used to examine wafer surfaces for particles, defects, and other inspection signals without contacting the wafer. Wafer inspection systems typically support process monitoring, excursion detection, and baseline cleanliness control at multiple points in semiconductor manufacturing.

Wafer inspection systems of this class generally scan a wafer with laser illumination and collect scattered or reflected light from the wafer surface. Wafer inspection systems of this class generally convert optical signals into defect maps or event data for later review and process trending. Wafer inspection systems of this class generally combine optics, motion stages, wafer handling, and control software to repeat inspections under fixed recipes.

Wafer inspection systems typically sit alongside deposition, clean, etch, and other wafer fabrication steps as in line monitors. Wafer inspection systems are commonly used after a process step to check whether particles or surface defects have been introduced before wafers continue to later manufacturing operations. Wafer inspection systems also support baseline tool qualification and recurring line monitoring.

Wafer inspection systems are used to monitor surface contamination, particle adders, and other defect signatures on production wafers and monitor wafers. Wafer inspection systems are commonly applied where surface condition matters to downstream yield, including after cleans, films, and pattern transfer related operations.