Lam Research
SEZ SP 304
The Lam Research SEZ SP 304 is a single-wafer processing system. The Lam Research SEZ SP 304 handles 12-inch wafers.[1][2]
What it is
How it works
General reference — not yet source-verifiedSingle-wafer wet processing systems treat one wafer at a time with liquid chemicals and rinse media. Single-wafer wet processing systems commonly combine wafer handling, fluid delivery, and controlled removal of liquids from the wafer surface. Wet cleaning tools in this class are used to clean, rinse, and condition wafer surfaces without using dry plasma as the primary treatment method.
Where it fits in the process flow
General reference — not yet source-verifiedWet processing and clean tools are used in wafer fabrication where surface preparation, residue removal, and rinsing are needed between other process modules. Single-wafer wet processors fit into clean sequences around deposition, etch, oxidation, implant, and lithography support operations where wafer surfaces must be prepared for the next step.
Applications
The SEZ SP 304 is used for wet processing and clean applications on silicon wafers.[2]
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Chemistry cabinets are used
- Some parts in the tool are corroded
- The tool has been repaired and converted to Bernoulli handling
- Software adjustments have been made
What do the numbers mean?
Vacuum & pumping3
Wafer handling4
Gas & chemistry2
Configuration & options19
- Equipped With:[3]
- 8-inch Bernoulli handling[3]
- Frontside and Backside (implemented by PTW) with Pinlesschuck and Pinchuck[3]
- Cold DI in Nozzle[3]
- Hot DI in Dispenser[3]
- Heat exchangers[3]
- 1x double hex with Lauda for Di[3]
- 1x double hex with Lauda for Medium 2[3]
- 1x single hex with Lauda for Medium 1 (not used)[3]
- 1x single hex with Lauda for Medium 3[3]
- 2 Cabinets with Maintank & Buffertank[3]
- Mixtank with 3 paddle wheels[3]
- Problems:[3]
- Some parts in the tool are corroded[3]
- Tool has been repaired and converted to Bernoulli handling[3]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Tokyo Electron Expedius Plus— Same function class: Wet Processing / Clean, UnknownCompare in depthsource[3]
- SCREEN WS 620 C— Same function class: Wet Processing / Clean, UnknownCompare in depthsource[3]
- EV Group 301— Same function class: Wet Processing / Clean, nullCompare in depthsource[4]
- Veeco Waferstorm 3300 M 3303 M 3304 Single Wafer Processing— Same function class: Wet Processing / Clean, nullCompare in depthsource[5]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the SEZ SP 304 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SEZ SP 304 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SEZ SP 304 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SEZ SP 304 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the SEZ SP 304 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the SEZ SP 304 are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Inventory photo
- [4]fabsurplus.com — fabsurplus.comfabsurplus.com
- [5]Equipment inventory listing
Last updated Oct 20, 2026.
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The EVG 301 is a semi-automated single wafer cleaning system for R&D, featuring megasonic cleaning, spinner rotation up to 3000 rpm, and optional pre-bonding and IR-inspection modules.
Tokyo Electron Expedius Plus is a wet bench for pre-diffusion clean applications.
Veeco / SSEC Waferstorm 3300 / M 3303 / M 3304 is a single wafer processing system for 6-inch wafers.
