Laurell

Wafer size
150mm
Power
95 to 240VAC, 47/63HZ, ~300 Watts[1]
Process applications and technology nodes documented for this tool.
Documented failure modes, common issues, and field considerations.
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The following facts about the WS-650-23 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the WS-650-23 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the WS-650-23 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the WS-650-23 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the WS-650-23 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the WS-650-23 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Last updated Jul 29, 2026.
Laurell's WS-400-6NPP is a 400-series spin coater with a 400-series process controller, a 1.75" vacuum chuck, and support for wafers up to 150 mm.
The Laurell EDC-HL-23 B is a compact EDC spin processor with capacity for up to 150 mm wafers and 5 in x 5 in substrates.
The Laurell H6-23 is a compact HL Series spin coater for wafers and substrates, with a maximum rotational speed of 12,000 RPM.
The Laurell Lz-23 B is a compact 650-series spin coater that accommodates up to 150 mm wafers and 5 in × 5 in substrates.