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Nanospec AFT Metrology

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Nanospec AFT Metrology — Inventory photo
Fig. 01Nanospec AFT MetrologyInventory photo[1]

What it is

The Onto Innovation Nanospec AFT Metrology is a metrology and inspection system. The tool is designed for the measurement of thickness of transparent thin films on substrates.[3][2]

How it works

The Nanospec AFT uses reflectometry, measuring reflected light to determine film thicknesses based on interference effects. Measurement algorithms compare a bare silicon wafer to the sample being tested to yield thickness information without causing damage to the sample.[3]

Applications

The Nanospec AFT is applied to measure the thickness of transparent thin films on silicon wafers. Measured film types include photoresists and oxides.[3]

What do the numbers mean?

Wafer handling5

Measurement target
Thickness of transparent thin films on silicon wafers[3]
Accurate?
Wafer diameters
100 mm, 150 mm[4]
Accurate?
Wafer materials
silicon[4]
Accurate?
Wafer holder
delrin[4]
Accurate?
Wafer thickness
200 .. 1000 µm[4]
Accurate?

Configuration & options4

Manufacturer
Onto Innovation[1]
Accurate?
Model
Nanospec AFT[1]
Accurate?
Category
Metrology & Inspection[2]
Accurate?
Measurement method
Reflectometry[3]
Accurate?
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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What types of films can the Nanospec AFT measure?

The Nanospec AFT is able to measure thickness of transparent thin films, including photoresists and oxides, on silicon wafers.[3]

Does the tool damage the sample during measurement?

The Nanospec AFT yields thickness information without causing damage to the sample.[3]

What operating principle does the Nanospec AFT use?

The Nanospec AFT uses reflectometry (measurement of reflected light) to determine film thicknesses based on interference effects.[3]

What is required to set up a measurement on the Nanospec AFT?

The instrument uses a bare reference wafer for calibration. After calibration, the user focuses the microscope on the sample and presses measure.[3]

Not publicly documented

The following facts about the Nanospec AFT Metrology are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Nanospec AFT Metrology are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Nanospec AFT Metrology are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Nanospec AFT Metrology are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Nanospec AFT Metrology are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Nanospec AFT Metrology is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]waferpedia.com — waferpedia.comwaferpedia.com
  3. [3]nist.gov — nist.govnist.gov
  4. [4]mems-exchange.orgmems-exchange.org
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Last updated Oct 9, 2026.

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