Tokyo Electron
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The Tokyo Electron Alpha 805 D is a thermal diffusion furnace.
A thermal diffusion furnace processes wafers in a heated tube or chamber to drive heat treatment reactions across the wafer surface and through shallow subsurface regions.
A diffusion furnace classically supports batch thermal processing for semiconductor wafers, where temperature and ambient composition control drive steps such as oxidation, diffusion, annealing, and similar heat-based operations.
A diffusion furnace is generally used after front-end wafer preparation steps that require elevated-temperature treatment and before later patterning or back-end integration steps.
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The Tokyo Electron Alpha 805 D is a furnace in the thermal or diffusion category.[1][2]
The Tokyo Electron Alpha 805 D supports 8-inch wafers.[1][2]
The Alpha 805 D was made by Tokyo Electron.[1]
The following facts about the Alpha 805 D are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alpha 805 D are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Alpha 805 D are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Alpha 805 D are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alpha 805 D are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alpha 805 D is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 16, 2026.
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