Tokyo Electron
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The Alpha 85 Z is a thermal/diffusion furnace manufactured by Tokyo Electron. The Alpha 85 Z handles 8-inch wafers. The Alpha 85 Z is configured for POCL3 processing.[1]
The Tokyo Electron Alpha 85 Z is a diffusion furnace classified under the Thermal / Diffusion equipment category. Diffusion furnaces are used in semiconductor manufacturing for processes such as thermal oxidation, dopant diffusion, and annealing of silicon wafers.
The furnace process is typically preceded by a cleaning step (e.g., RCA clean) and may be followed by a drive-in anneal or oxidation step to activate and diffuse the dopant further.
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The chamber environment helps ensure that heat treatment occurs consistently and that the wafer surface is not exposed to uncontrolled contamination or unwanted reactions.
The following facts about the Alpha 85 Z are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alpha 85 Z are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Alpha 85 Z are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Alpha 85 Z are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alpha 85 Z are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alpha 85 Z is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 12, 2026.
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