Tokyo Electron
NS 300 + Wafer
What it is
General reference — not yet source-verifiedA wafer scrubber is a cleaning machine used to remove particulate and process residues from wafer surfaces during manufacturing. In this class of equipment, wafers are transported through a wet-clean sequence rather than through a dry etch or deposition step.
How it works
General reference — not yet source-verifiedIn this equipment class, cleaning is intended to dislodge contaminants, loose particles, and residue before later process steps. The tool is built around controlled liquid contact, wafer transport, and rinse-and-dry style handling rather than material removal by plasma or ion bombardment.
Where it fits in the process flow
General reference — not yet source-verifiedA wafer scrubber sits in the wet-clean portion of the semiconductor line, typically after earlier process steps that leave particles or residues on the wafer and before later lithography, deposition, or inspection steps that benefit from a cleaner surface. It is part of the surface-preparation flow for bare or processed wafers.
What do the numbers mean?
Power & electrical2
Wafer handling1
Gas & chemistry1
Configuration & options6
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What does this class of machine do to wafers?General reference — not yet source-verified
It removes contaminants, residues, and other unwanted surface material from wafers while preparing them for later fabrication steps.
Where is this type of equipment used in manufacturing?General reference — not yet source-verified
It is used in process segments that require a clean wafer surface before deposition, thermal processing, inspection, or similar follow-on operations.
What is the main purpose of wet clean equipment?General reference — not yet source-verified
Its main purpose is contamination control and surface preparation, so wafers can move to the next step with reduced residue and particle load.
How does this class of machine clean wafers?General reference — not yet source-verified
It typically combines controlled liquid chemistry, rinsing, and drying to dissolve, lift, and remove unwanted material from the wafer surface.
Not publicly documented
The following facts about the NS 300 + Wafer are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NS 300 + Wafer are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NS 300 + Wafer are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NS 300 + Wafer are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NS 300 + Wafer are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NS 300 + Wafer is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (6)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Inventory photo
- [4]Inventory photo
- [5]Equipment inventory listing
- [6]Tokyo Electron | Products NS 300 Wafer Scrubber — tel.com (Apr 14, 2005)web.archive.org
Last updated Jul 29, 2026.
Compare with similar tools
View all →The Glen/YES 1000FP is a plasma cleaning system designed to accept a range of shelf sizes for changing flat panel industry needs.
The 1000P is a plasma cleaning system with four 16 x 16 inch shelves and a total capacity of 1024 square inches.