Waferpedia

YES

58TA

Thermal / Diffusion300mmYES 58TA family
Research Quality: 60% complete
58TA — pnf.uchicago.edu
Fig. 0158TApnf.uchicago.edu[1]

Wafer size

300mm

Vacuum

2 loads/hour[1]

Performance

1 load/hour[1]

What is it?

The YES-58TA Vacuum Bake/HMDS Vapor Prime and Image Reversal System is described as a vapor prime and image reversal oven. It uses NH3 vapor to create negative images using a positive photoresist, supports image reversal bake, vapor prime, and vacuum bake processes, and handles wafers up to 300 mm.

What can it run?

Process applications and technology nodes documented for this tool.

  • Image reversal bake
  • Vapor prime
  • Vacuum bake

What do the numbers mean?

Vacuum & pumping1

Vacuum bake/vapor prime throughput
2 loads/hour[1]
Accurate?

Wafer handling1

Wafer handling
handles wafers up to 300 mm[1]
Accurate?

Performance1

Image reversal bake throughput
1 load/hour[1]
Accurate?

Control & software1

Process control
fully programmable process time and temperature[1]
Accurate?

Configuration & options1

Operation temperature
ambient to 180 °C[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Vacuum bake/vapor prime throughput2 loads/hour[1]

Where are the manuals?

Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Frequently asked questions

What process functions does the YES-58TA support?

It supports image reversal bake, vapor prime, and vacuum bake.[1]

What is the operating temperature range?

The operation temperature ranges from ambient to 180 °C.[1]

What wafer size can it handle?

It handles wafers up to 300 mm.[1]

What does the system use NH3 vapor for?

It uses NH3 vapor to allow the creation of negative images using a positive photo-resist.[1]

Not publicly documented

The following facts about the 58TA are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 58TA are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 58TA are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 58TA are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 58TA are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 58TA is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]pnf.uchicago.edupnf.uchicago.edupnf.uchicago.edu
  2. [2]YES Image Reversal Oven Instructionscnfusers.cornell.educnfusers.cornell.edu
  3. [3]Yield Engineering Systems, Inc. > Products > Vacuum Bake Systems > TA Seriesyieldengineering.com (Mar 29, 2012)web.archive.org
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Last updated Jul 29, 2026.

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