Lam Research 2300

Models in this family

1. 

   2300

   Lam Research 2300 is an etch system used for pattern transfer in semiconductor processing. It belongs to the class of plasma-based etch equipment used to remove selected material from a wafer according to a patterned mask.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   Lam 2300 Etch Chamber	—	2023	Described as an etch chamber with 8-inch and 12-inch wafer sizes, 3 chambers, and included subsystems/software.	Equipment inventory listing[1]
   Lam 2300	—	2019	Listed as 12-inch equipment with KIYO EXP MRT.	Equipment inventory listing[2]
   Lam 2300, 12" KIYO EXP MRT	—	2019–2019	Described as a 12-inch unit with KIYO EXP MRT.	Equipment inventory listing[2]
   Lam 2300, 12"	—	2016–2016	Described as a 12-inch unit.	Equipment inventory listing[3]

2. 2300 e 5 Exelan Flex EX

   Lam 2300 e 5 Exelan Flex EX is an etcher for 12-inch wafers.

3. 

   2300 e 5 Kiyo
4. 2300 Exelan
5. 

   2300 Exelan Flex

   The Lam Research 2300 Exelan Flex is an etch tool, with sources describing it as an etch chamber or etcher.

6. 

   2300 Exelan Flex 45 Dielectric

   Lam 2300 Exelan Flex 45 Dielectric Etcher is a single-chamber etching system with a homemade manual load lock and 12 gas lines.

7. 

   2300 Flex 45

   Lam 2300 Flex 45 is an etcher identified with metal high-productivity wet strip (HP MWS) use and a three-chamber configuration.

8. 2300 Kiyo EX
9. 

   2300 Kiyo GX RIE

   The Lam 2300 Kiyo GX RIE is a reactive ion etcher described with Poly, Corvus Tx, 6-channel, polysilicon film type, and 4 FOUP ports.

10. 

    2300 Microwave Strip
11. 

    2300 V 2 Kiyo 45

    Cited variants

    Designation	Generation	Vintage	Changes	Source
    Lam 2300 V 2 Kiyo 45 Etcher - Polysilicon - 4ch - SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2 - Edwards STP XA2703CV 2008 Vintage	—	2008	Listed with polysilicon, 4ch, the gas set, Edwards STP XA2703CV, and 2008 vintage.	Equipment inventory listing[4]
    Lam 2300 V 2 Kiyo 45 Etcher - Polysilicon - 4ch - SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2 - Edwards STP XA2703CV 2007 Vintage	—	2007	Listed with polysilicon, 4ch, the gas set, Edwards STP XA2703CV, and 2007 vintage.	Equipment inventory listing[5]
    Lam 2300 V 2 Kiyo 45 Etcher - Polysilicon - 4ch - SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2 - Edwards STP XA2703CV 2009 Vintage	—	2009	Listed with polysilicon, 4ch, the gas set, Edwards STP XA2703CV, and 2009 vintage.	Equipment inventory listing[6]
    Lam 2300 V 2 Kiyo 45 Etcher	—	2007–2007	Listed with an Edwards STP XA2703CV pump and described as 2007 vintage.	Equipment inventory listing[5]

Sources