23 entries
- Paradigme XP LightMattsonCategoryEtch
- ParadigmeMattsonCategoryEtch
- AST 2800Mattson
- AspenMattsonCategoryDeposition
- AST 2800 RTPMattsonCategoryThermal / Diffusion
- AST 280 RTPMattsonCategoryThermal / Diffusion
- Aspen II ICP LEMattson
The Mattson Aspen II ICP LE is an etcher for 8-inch wafers, introduced in 1997.
CategoryEtch - Aspen II RTAMattsonCategoryEtch
- Steag / AST 2900 RTPMattsonCategoryThermal / Diffusion
- AST 2000Mattson
- 8800Mattson
Mattson 8800 is a third-generation RTP tool developed for 0.25-micron process requirements and described as a 200 mm single-wafer RTP tool.
CategoryThermal / DiffusionWafer200mmNode0.25-micron - Millios RTPMattsonCategoryThermal / Diffusion
- Helios RTPMattsonCategoryThermal / Diffusion
- RFS 3019Mattson
- Aspen IIIMattson
- AST 2800 SMIF RTPMattsonCategoryThermal / Diffusion
- Steag / AST Heatpulse 610 RTPMattsonCategoryThermal / Diffusion
- 2800 RTPMattsonCategoryThermal / Diffusion
- AST 3000 RTPMattsonCategoryThermal / Diffusion
- AST 2900 RTPMattsonCategoryThermal / Diffusion
- SHS 2800 RTAMattson
The Mattson SHS 2800 RTA is a rapid thermal anneal system described with front-end or tool-controller configurations, a ripple pyrometer for temperature measurement, and a jet venturi cooling system.
CategoryThermal / Diffusion - Steag / AST 2800 RTPMattson
The Mattson / Steag / AST 2800 RTP System is a Rapid Thermal Process system.
CategoryThermal / Diffusion - Aspen IIMattson
