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Manufacturer

Mattson

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23 entries

  1. Aspen II RTAMattson

    The Mattson Aspen II RTA is an etch tool that processes 8-inch wafers.

    CategoryEtch
  2. Aspen II ICP LEMattson

    The Mattson Aspen II ICP LE is an etcher for 8-inch wafers, introduced in 1997.

    CategoryEtch
  3. AST 280 RTPMattson

    The Mattson AST 280 RTP is a rapid thermal processing (RTP) system for semiconductor thermal/diffusion applications.

    CategoryThermal / Diffusion
  4. AspenMattson

    The Mattson Aspen is a family of plasma processing systems for strip, etch, and deposition, including the Aspen II and Aspen III platforms.

    CategoryDeposition
  5. Aspen IIMattson

    The Mattson Aspen II Asher is a semiconductor ashing tool offered by Mattson, with configurations supporting 6-inch and 8-inch wafer sizes.

  6. SHS 2800 RTAMattson

    The Mattson SHS 2800 RTA is a rapid thermal anneal system described with front-end or tool-controller configurations, a ripple pyrometer for temperature measurement, and a jet venturi cooling system.

    CategoryThermal / Diffusion
  7. Steag / AST 2900 RTPMattson

    The Mattson / Steag / AST 2900 RTP is a rapid thermal processor used in semiconductor manufacturing.

    CategoryThermal / Diffusion
  8. AST 2000Mattson
  9. 2800 RTPMattson

    The Mattson 2800 RTP is a rapid thermal process system for mainstream RTP applications.

    CategoryThermal / Diffusion
  10. RFS 3019Mattson
  11. Aspen IIIMattson

    The Mattson Aspen III is a plasma processing platform offered in asher and plasma-enhanced chemical vapor deposition configurations, with variants supporting 200mm and 300mm wafers.

  12. Paradigme XP LightMattson

    The Mattson Paradigme XP Light is an etcher used in semiconductor manufacturing.

    CategoryEtch
  13. AST 2800 SMIF RTPMattson

    The Mattson AST 2800 SMIF RTP is a rapid thermal process system in the thermal / diffusion equipment class.

    CategoryThermal / Diffusion
  14. ParadigmeMattson

    The Mattson Paradigme (also styled as paradigmE) is a dry etch system used for advanced pattern multiplying etches at the 20 nm technology node and below.

    CategoryEtch
  15. AST 2800Mattson

    The Mattson AST 2800 is a thermal processing tool in the AST 2800 family.

  16. Steag / AST Heatpulse 610 RTPMattson

    The Mattson Steag / AST Heatpulse 610 RTP is a rapid thermal process (RTP) system for 6-inch wafers with a temperature range of 400-1250 °C.

    CategoryThermal / Diffusion
  17. Helios RTPMattson

    General referenceThe Mattson Helios RTP is a rapid thermal processing (RTP) system used for single-wafer thermal treatments in semiconductor manufacturing.

    CategoryThermal / Diffusion
  18. AST 3000 RTPMattson

    Mattson AST 3000 RTP System is a rapid thermal processing system for 8-inch wafers.

    CategoryThermal / Diffusion
  19. Millios RTPMattson

    The Mattson Millios RTP is a rapid thermal process system used in semiconductor manufacturing.

    CategoryThermal / Diffusion
  20. AST 2800 RTPMattson

    The Mattson AST 2800 RTP is a rapid thermal process system.

    CategoryThermal / Diffusion
  21. AST 2900 RTPMattson

    The Mattson AST 2900 RTP is a rapid thermal process system. The Mattson AST 2900 RTP is categorized as Thermal / Diffusion.

    CategoryThermal / Diffusion
  22. 8800Mattson

    Mattson 8800 is a third-generation RTP tool developed for 0.25-micron process requirements and described as a 200 mm single-wafer RTP tool.

    CategoryThermal / DiffusionWafer200mmNode0.25-micron
  23. Steag / AST 2800 RTPMattson

    The Mattson / Steag / AST 2800 RTP System is a Rapid Thermal Process system.

    CategoryThermal / Diffusion