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Applied Materials

Centura 5200 MXP+

EtchApplied Materials Centura 5200 family
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Centura 5200 MXP+ — Inventory photo
Fig. 01Centura 5200 MXP+Inventory photo[1]

Power

208 VAC, 3 Phase, 240 A, 50/60 Hz[5]

Vacuum

IQDP80 (x4) / IQDP80/WSU151 (x2)[6]

Gas delivery

32 Digital MFCs (14-Unit or 18-Horiba)[1]

What it is

The Applied Materials Centura 5200 MXP+ Etch is a plasma etch system used in semiconductor manufacturing.[1][8][6][7][9][11]

How it works

The Centura 5200 MXP+ is configured with an HP robot, dry pumps, a gas delivery manifold with digital mass flow controllers, and an endpoint monochromator.[1][8][6][7]

Where it fits in the process flow

The tool is used for polysilicon etch and dielectric etch process flows.[6][7][9][11]

Applications

The tool is configured with gases including NF3, CH3F, CL2, HBr, CHF3, Ar, CF4, O2, N2, C4F8, CO, and HE/O2 in one configuration.[1][6][7]

What do the numbers mean?

Power & electrical6

Voltage
208 VAC, 3 Phase, 240 A, 50/60 Hz[5]
Accurate?
HF RF Gen Type
ENI OEM 12B-3[5]
Accurate?
Etch RF Match Type
Phase 4[8]
Accurate?
LF RF Gen Type
None[5]
Accurate?
HF RF generator type
ENI OEM 12B-3[8]
Accurate?
LF RF generator type
None[8]
Accurate?

Vacuum & pumping6

Dry Pumps
IQDP80 (x4) / IQDP80/WSU151 (x2)[6]
Accurate?
Loadlock pump
Ebara[5]
Accurate?
Pump Size
A 10[5]
Accurate?
Vacuum pumps
IQDP80 (x4) / IQDP80/WSU151 (x2)[1]
Accurate?
Dry pumps
4-IQDP80, 2-IQDP80/WSU151[6]
Accurate?
Dry pumps
1-DS80, 3-DS700[7]
Accurate?

Wafer handling4

HP Robot[1]
Accurate?
Wafer size
200 mm[6]
Accurate?
Robot
HP Robot[7]
Accurate?
Configured wafer size
200 mm[7]
Accurate?

Gas & chemistry9

Gases Used
NF3, CH3F, CL2, HBr, CHF3, Ar, CF4, O2, N2, C4F8, CO[1]
Accurate?
Mass Flow Controllers (MFCs)
32 Digital MFCs (14-Unit or 18-Horiba)[1]
Accurate?
Gas Panel Type
Standard[5]
Accurate?
Gas delivery
32 Digital MFCs (14-Unit or 18-Horiba)[8]
Accurate?
Gas set
NF3, CH3F, CL2, HBr, CHF3, Ar, CF4, O2, N2, C4F8, CO[1]
Accurate?
Gas set
NF3, CH3F, CL2, HBR, CHF3, AR, CF4, O2, N2, C4F8, CO, HE/O2[6]
Accurate?
Gas set
CO, N2, C4F8, O2, CF4, CHF3, AR[7]
Accurate?
Mass flow controllers
32 Digital MFCs 14-Unit or 18-Horiba[6]
Accurate?
Mass flow controllers
28 Digital MFCs 25-Unit or 3-Horiba[7]
Accurate?

Control & software3

Software Version
4.9_15[7]
Accurate?
System Controller
Standard[5]
Accurate?
Control software
4.9_15[6]
Accurate?

Configuration & options30

Components:[1]
Accurate?
Orienter (x1)[1]
Accurate?
MxP Poly (x1)[1]
Accurate?
MxP+ Poly (x2)[1]
Accurate?
eMxP+ (x1)[1]
Accurate?
ESC Type
Polymide[1]
Accurate?
Endpoint
Monochromator[6]
Accurate?
Chillers
Neslab 150 units (x5)[1]
Accurate?
Mainframe
SHO[5]
Accurate?
Fab Installation
TTW[5]
Accurate?
System Umbilicals
50 ft - standard[5]
Accurate?
Heat Exchanger Type 1
AMAT 0[5]
Accurate?
Heat Exchanger Type 2
Neslab[5]
Accurate?
I/O Slit Valve Type
Viton[5]
Accurate?
FAB Monitor
TTW[5]
Accurate?
Liquid Delivery
None[5]
Accurate?
Chamber A
MXP[5]
Accurate?
Slit Valve Type
Anodized[5]
Accurate?
Chamber A Process
Oxide[5]
Accurate?
Process Kit Type
Oxide Etch ESC[5]
Accurate?
Manufacturer
Applied Materials[1]
Accurate?
Model
Centura 5200 MXP+[1]
Accurate?
Category
Etch[8]
Accurate?
Configured for
200 mm[6]
Accurate?
Chillers
5-Neslab-150[6]
Accurate?
Chillers
4 Neslab 150[7]
Accurate?
Endpoint
Polymide[7]
Accurate?
Components
Orienter (x1), MxP Poly (x1), MxP+ Poly (x2), eMxP+ (x1)[1]
Accurate?
Components
Qty 1 - Orienter, Qty 1 - MxP Poly, Qty 2 - MxP+ Poly, Qty 1 - eMxP+[6]
Accurate?
Components
Qty 4 - MxP+ Dielectric[7]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Centura 5200 MxP Chamber——Described as an MxP Etching Chamber with 200 mm version.fabsurplus.com[9]
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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Gases UsedNF3, CH3F, CL2, HBr, CHF3, Ar, CF4, O2, N2, C4F8, CO[1]
  • Mass Flow Controllers (MFCs)32 Digital MFCs (14-Unit or 18-Horiba)[1]
  • Dry PumpsIQDP80 (x4) / IQDP80/WSU151 (x2)[6]
  • Gas Panel TypeStandard[5]
  • Voltage208 VAC, 3 Phase, 240 A, 50/60 Hz[5]
  • Loadlock pumpEbara[5]
  • Pump SizeA 10[5]
  • HF RF Gen TypeENI OEM 12B-3[5]
  • Etch RF Match TypePhase 4[8]
  • LF RF Gen TypeNone[5]
  • HF RF generator typeENI OEM 12B-3[8]
  • LF RF generator typeNone[8]
  • Vacuum pumpsIQDP80 (x4) / IQDP80/WSU151 (x2)[1]
  • Gas delivery32 Digital MFCs (14-Unit or 18-Horiba)[8]
  • Gas setNF3, CH3F, CL2, HBr, CHF3, Ar, CF4, O2, N2, C4F8, CO[1]
  • Gas setNF3, CH3F, CL2, HBR, CHF3, AR, CF4, O2, N2, C4F8, CO, HE/O2[6]
  • Gas setCO, N2, C4F8, O2, CF4, CHF3, AR[7]
  • Mass flow controllers32 Digital MFCs 14-Unit or 18-Horiba[6]
  • Mass flow controllers28 Digital MFCs 25-Unit or 3-Horiba[7]
  • Dry pumps4-IQDP80, 2-IQDP80/WSU151[6]
  • Dry pumps1-DS80, 3-DS700[7]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What is the typical number of process chambers on a Centura platform?General reference — not yet source-verified

Centura cluster tools generally support multiple process chambers arranged around a central transfer module, though the exact number can vary by configuration and generation.

Is this platform suitable for conductor etch applications?General reference — not yet source-verified

The Centura 5200 MXP+ is specifically designed for dielectric etch. Conductor etch applications typically use different chemistries and hardware configurations on other platforms.

Not publicly documented

The following facts about the Centura 5200 MXP+ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura 5200 MXP+ are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the Centura 5200 MXP+ are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Centura 5200 MXP+ are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Centura 5200 MXP+ is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Centura 5200 MXP+ are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (11)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Inventory photo
  3. [3]Inventory photo
  4. [4]Inventory photo
  5. [5]Inventory photo
  6. [6]macquarie.com — macquarie.commacquarie.com
  7. [7]macquarie.com — macquarie.commacquarie.com
  8. [8]waferpedia.com — waferpedia.comwaferpedia.com
  9. [9]fabsurplus.com — fabsurplus.comfabsurplus.com
  10. [10]waferpedia.comwaferpedia.com
  11. [11]Applied Materials Centura 5200 MxP+ Dielectric Dielectric Etch for sale — fabsurplus.comfabsurplus.com
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Last updated Oct 11, 2026.

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