ASML PAS 5500

Models in this family

1. 

   PAS 5500introduced 2000produced 2000–2010i-lineLegacy

   The ASML PAS 5500/275D is a high-throughput i-line stepper with 5X reduction, 365 nm exposure, and automated wafer handling for substrates up to 200 mm diameter.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   PAS 5500/275D	i-line	—	High-throughput i-line stepper using 365 nm light; 5X reduction and projection capability; automated wafer handling for substrates from 200 mm diameter wafers down to small pieces.	nist.gov[1]
   PAS 5500/60	i-line	—	Automatic 100 mm wafer cassette processing capability; 365 nm near-UV light; minimum feature size of 450 nm; 150 mm capable with advanced notice.	snfguide.stanford.edu[2]
   PAS 5500/350C	—	2000–2010	DUV photolithography stepper using 248 nm KrF laser source; 4x or 5x reduction; high throughput; handles 100 mm wafers by default and 150 mm on request.	epfl.ch[3]
   PAS 5500/300	DUV	—	Described as a DUV stepper configured for 4-inch wafers.	wiki.nanotech.ucsb.edu[4]
   PAS 5500/200	i-line	—	Described as a 5X reduction, i-line stepper for 6 inch wafers using 6 inch reticles, with 350 nm resolution, 0.48-0.60 variable numerical aperture, 22x22 mm maximum field size, and better than 50 nm overlay capability.	manualslib.com[5]
   PAS 5500/400	Step & Scan	1995	Described as the second step & scan system released by ASML, with a 4X reduction ratio and maximum long-term mask overlay of 35 nm.	chiphistory.org[6]

2. PAS 5500 100

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   PAS 5500/150	i-line	—	Described as the successor to the PAS 5500/100 i-line system and optimized for high-volume semiconductor production.	web.archive.org[7]

3. 

   PAS 5500 100 D
4. 

   PAS 5500 1100 Wafer
5. 

   PAS 5500 1150 C Wafer
6. 

   PAS 5500 300 C
7. 

   PAS 5500 300 C DUV

   ASML PAS 5500 / 300 C is a DUV stepper described as a deep ultraviolet lithography system.

8. 

   PAS 5500 300 C Wafer
9. 

   PAS 5500 400 i-Line

   The ASML PAS 5500/400 is an i-line stepper for 8-inch wafers with a resolution of 280nm, introduced around 2002.

10. PAS 5500 60
11. 

    PAS 5500 750
12. 

    PAS 5500 850 D

    The ASML PAS 5500/850 D is a scanner for 6-inch wafers, using a Cymer ELS-6610 light source and supporting R type, 1.2 mm notch and flat wafers.

Sources