Waferpedia

Oxford Instruments

Plasmalab-80plus-Cloey-S

Plasmalab-80plus-Cloey-S — cores.research.asu.edu
Fig. 01Plasmalab-80plus-Cloey-Scores.research.asu.edu[1]

Wafer size

100mm

Power

< 270 Watts[1]

Vacuum

< 250 mTorr[1]

Gas delivery

BCl3, Cl2, N2, CF4, O2, Ar[1]

What is it?

The PlasmaLab M80 Plus – Chlorine is described as an open load reactive ion etch system. Its listed process gases are BCl3, Cl2, N2, CF4, O2, and Ar, and it is used for etching compound semiconductors and metals. The source states that photoresist and dielectrics are allowed masks, and gives wafer size and operating ranges for platen size, power, MFC flow, and pressure.

What can it run?

Process applications and technology nodes documented for this tool.

  • Etching compound semiconductors
  • Etching metals

What do the numbers mean?

Power & electrical1

Power range
< 270 Watts[1]
Accurate?

Vacuum & pumping1

Pressure range
< 250 mTorr[1]
Accurate?

Gas & chemistry8

Process gases
BCl3, Cl2, N2, CF4, O2, Ar[1]
Accurate?
Allowed masks
Photoresist and dielectrics[1]
Accurate?
MFC flow range - BCl3
0 – 100 sccm[1]
Accurate?
MFC flow range - Cl2
0 – 50 sccm[1]
Accurate?
MFC flow range - CF4
0 – 100 sccm[1]
Accurate?
MFC flow range - O2
0 – 50 sccm[1]
Accurate?
MFC flow range - Ar
0 – 100 sccm[1]
Accurate?
MFC flow range - N2
0 – 100 sccm[1]
Accurate?

Configuration & options2

Use
Etching of compound semiconductors and metals[1]
Accurate?
Platen size
238 mm[1]
Accurate?
Interested in this tool?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Process gasesBCl3, Cl2, N2, CF4, O2, Ar[1]
  • Allowed masksPhotoresist and dielectrics[1]
  • Power range< 270 Watts[1]
  • MFC flow range - BCl30 – 100 sccm[1]
  • MFC flow range - Cl20 – 50 sccm[1]
  • MFC flow range - CF40 – 100 sccm[1]
  • MFC flow range - O20 – 50 sccm[1]
  • MFC flow range - Ar0 – 100 sccm[1]
  • MFC flow range - N20 – 100 sccm[1]
  • Pressure range< 250 mTorr[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the Plasmalab-80plus-Cloey-S are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Plasmalab-80plus-Cloey-S are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Plasmalab-80plus-Cloey-S are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Plasmalab-80plus-Cloey-S are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Plasmalab-80plus-Cloey-S are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Plasmalab-80plus-Cloey-S is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]cores.research.asu.educores.research.asu.educores.research.asu.edu
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Last updated Jul 29, 2026.

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