Oxford Instruments
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The following facts about the plasmapro-ngp80-rie are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the plasmapro-ngp80-rie are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the plasmapro-ngp80-rie are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the plasmapro-ngp80-rie are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the plasmapro-ngp80-rie are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the plasmapro-ngp80-rie is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Jul 29, 2026.
The Plasma Therm 720/740 is a dual-chamber RIE loadlocked system with chlorine- and fluorine-based chemistry.
Tegal 980 ACS is a plasma etch system series described as serving the 200mm fab line.
The Memsstar Orbis Alpha Oxide Etch System is a small-footprint, self-contained oxide etch system that uses hydrogen fluoride etchants.
Oxford Instruments Plasmalab 80+ is a compact open-loading reactive ion etch system for R&D or small-scale production.