Oxford Instruments
PlasmaPro100
Plate 01PlasmaPro 100 Estrelas DRIE – Oxford Instruments Plasma Technology
Oxford InstrumentsWatch on YouTubePlate 02Deep Reactive Ion Etching system - PlasmaPro 100 Estrelas - Oxford Instruments
Oxford InstrumentsWatch on YouTube
Wafer size
100mm
Gas delivery
chlorine and bromine chemistry[1]
What is it?
What can it run?
Process applications and technology nodes documented for this tool.
- metals etching
- deep polymer etching
- Si, SiO2 and Si3N4 thin films etching
What do the numbers mean?
Wafer handling1
Gas & chemistry1
Optics & imaging1
- Endpoint detection
- laser reflectometry/interferometry and optical emission spectroscopy (EOS) endpoint detection[1]
Configuration & options7
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- STS Multiplex ICP— Same function class: Etch, 100mmCompare in depthsource[2]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Chemistrychlorine and bromine chemistry[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the PlasmaPro100 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PlasmaPro100 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the PlasmaPro100 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the PlasmaPro100 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the PlasmaPro100 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the PlasmaPro100 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]epfl.ch — epfl.chepfl.ch
- [2]cores.research.asu.educores.research.asu.edu
- [3]SPTS APS ‒ Center of MicroNanoTechnology CMi ‐ EPFL — epfl.chepfl.ch
- [4]TEL Unity Me ‒ Center of MicroNanoTechnology CMi ‐ EPFL — epfl.chepfl.ch
Last updated Jul 29, 2026.
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