Tokyo Electron
CleanTrack ACT 8
Wafer size
100mm
Node / era
DUV lithography
Performance
High throughput in a small footprint[1]
Optics
In-line exposure unit interface[1]
What is it?
What can it run?
Process applications and technology nodes documented for this tool.
- DUV lithography
- Photoresist coating
- Photoresist development
- Anti-reflective coating processing
- Post-exposure bake and related thermal processing
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Wafers going through the track must have a clean backside.
- Small particles can hinder printing of small features and/or contaminate the wafer stage for subsequent batches.
- Wafers with contaminated or dirty backsides should be removed from the batch.
- Wafer stage cleaning is described as delicate, complex, wearing, time-consuming, and requiring recalibration.
- Users liable of wafer stage contamination will be billed cleaning hours and may lose access to the machine.
- The source warns that using the wrong cassette type may put the carrier robot arm and wafers in serious danger.
What do the numbers mean?
Wafer handling4
Gas & chemistry2
- Cluster configuration
- Coater and developer track in-line with an ASML PAS5500/350C stepper[1]
Optics & imaging1
Performance1
Configuration & options1
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the CleanTrack ACT 8 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CleanTrack ACT 8 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the CleanTrack ACT 8 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the CleanTrack ACT 8 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented compatible parts, consumables, or accessories for the CleanTrack ACT 8 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the CleanTrack ACT 8 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]epfl.ch — epfl.chepfl.ch
- [2]Inventory photo
- [3]Inventory photo
- [4]Inventory photo
Last updated Jul 29, 2026.
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