Applied Materials
Centura 5200 WXZ
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
A chemical vapor deposition system deposits material from a gaseous precursor onto the wafer under controlled process conditions.[5]
Where it fits in the process flow
The Centura 5200 WXZ Metal is used where a controlled metal film must be deposited on 8-inch wafers.[5]
Applications
What do the numbers mean?
Wafer handling1
Gas & chemistry1
Configuration & options7
Vintage & configurations
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Process typeMetal CVD (Chemical Vapor Deposition)[4]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What types of deposition processes can this class of tool perform?General reference — not yet source-verified
Cluster tools in this class can be configured for a variety of deposition techniques, including chemical vapor deposition, physical vapor deposition, and atomic layer deposition. The specific process chambers attached to the central platform determine the available deposition methods.
What are typical maintenance considerations for such systems?General reference — not yet source-verified
Routine maintenance includes cleaning or replacing hardware in the process chambers that accumulates deposits over time, such as showerheads, susceptors, and shields. The robotic handling system and vacuum pumps also require periodic servicing to ensure reliable operation and consistent process results.
Can this tool handle multiple film types in a single recipe?General reference — not yet source-verified
Yes. Because the cluster tool has multiple process chambers, a single wafer can be moved from chamber to chamber to deposit different films sequentially. For example, a dielectric layer may be deposited in one chamber and a metal layer in another, all within the same system without breaking vacuum.
What factors influence the choice of this class of tool over standalone deposition systems?General reference — not yet source-verified
Key considerations include the need for integrated processing to minimize contamination, the desire for higher throughput through parallel or sequential multi-step recipes, and the ability to reduce overall cleanroom space. Cluster tools are generally more complex and costly but offer significant advantages for advanced process flows.
Not publicly documented
The following facts about the Centura 5200 WXZ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura 5200 WXZ are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Centura 5200 WXZ are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura 5200 WXZ are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura 5200 WXZ is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Centura 5200 WXZ are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (7)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]waferpedia.com — waferpedia.comwaferpedia.com
- [4]macquarie.com — macquarie.commacquarie.com
- [5]waferpedia.com — waferpedia.comwaferpedia.com
- [6]Deposition Equipment | Metal CVD (Chemical Vapor Deposition) | Macquarie Group — macquarie.commacquarie.com
- [7]Applied Materials Centura 5200 WxZ / Sprint W Metal CVD (Chemical Vapor Deposition) for sale — fabsurplus.comfabsurplus.com
Last updated Oct 13, 2026.
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