RF 350 S

The Veeco RF 350 S is an etch tool. The Veeco RF 350 S is an ion mill. The Veeco RF 350 S is configured as a single-chamber system. The Veeco RF 350 S uses argon gas. The Veeco RF 350 S runs on Windows 2000.^[2][1]

Ion milling is a physical etch method. Ion milling tools generate ions from a process gas and direct those ions toward the wafer or substrate to remove material by sputtering. Ion milling is used when a process calls for directional material removal and close control of etched features. Single-chamber ion milling systems combine the process enclosure and the substrate handling space in one main process module.

Ion milling tools are used in pattern transfer after film deposition and lithographic pattern definition. Ion milling tools usually sit downstream of coating, masking, and alignment steps, and upstream of resist stripping, cleaning, inspection, and later integration steps. Ion milling is commonly chosen when a process flow needs anisotropic removal of conductive, magnetic, or otherwise difficult-to-etch films.

Ion milling systems are used for subtractive patterning of thin films in semiconductor, compound-material, and microfabrication work. Ion milling is applied to materials and stacks that are more suitable for physical sputter removal than for reactive plasma chemistry. Ion milling is also used for device structures that depend on directional etching with limited chemical selectivity.