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The Hitachi S-4700 is a field emission scanning electron microscope used for detailed image analysis and equipped with EDX capabilities.

The Alpsitec E 460 CMP tool is a semi-automatic system for polishing and planarizing wafers.

The Hitachi SU 8030 FEG-SEM is a field emission gun scanning electron microscope.

The Temescal CV-6S is an electron-beam evaporation system configured with a load-lock, dual 4-pocket e-beam sources, and a CV-6S 10 kV power supply.

The Thermo Fisher Scientific / FEI Strata DB 235 is a focused ion beam system with a Schottky FEG, immersion objective lens, and Magnum ion column.

Riber Multi-4 is a multi-substrate production MBE system for producing compound semiconductor epiwafers.

The Disco DAG810 is a compact automatic surface grinder used for thinning silicon, III/V materials, glass types, wafers, stacked wafers, and chips.

The CEE 100CB is a spinner/hotplate for handling substrates from 1 cm² to 4-inch wafers and for use with standard positive photoresists only.

The Leica EM ACE600 is a sputter coater used for deposition of thin iridium films prior to SEM sample imaging.

The Nikon NSR-1505G4 is a wafer stepper with 5x reduction for 5-inch reticles and 4-inch wafers, using g-line UV and providing better than 750 nm resolution and better than 150 nm alignment.

The Semitool 880 is a spin rinser/dryer that rinses masks and wafers in DI water to 15 MΩ and dries them with heated nitrogen.

Zeiss MERLIN is a scanning electron microscope at CMi reserved for imaging and process-control inspection, with support for imaging, EDX analysis, and offline analysis in ProSEM.