Waferpedia

CEE

100CB

Spinner/Hotplate4"CEE 100CB family
Research Quality: 40% complete
100CB — nanofab.ece.cmu.edu
Fig. 01100CBnanofab.ece.cmu.edu[1]
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Wafer size

4"

Vacuum

Mounted in an exhausted custom hood[1]

Gas delivery

Standard positive photoresists only[1]

What is it?

The sources describe the CEE 100CB as both a table-top spinner/hotplate and a bench-mounted spinner/hotplate. It is specified for substrates from 1 cm² to 4-inch wafers, standard positive photoresists only, spin speeds up to 5000 rpm, and up to 10 programmable process steps, with a programmable vacuum hotplate for baking photoresist.

What can it run?

Process applications and technology nodes documented for this tool.

  • Photoresist baking
  • Spinning substrates

What do the numbers mean?

Vacuum & pumping3

Hotplate
Programmable vacuum hotplate for baking photoresist[1]
Accurate?
Mounting
Mounted in an exhausted custom hood[1]
Accurate?
Mounting
Mounted in an exhausted wet bench[2]
Accurate?

Wafer handling1

Substrate range
1 cm² to 4" wafers[1]
Accurate?

Gas & chemistry1

Photoresist compatibility
Standard positive photoresists only[1]
Accurate?

Configuration & options6

Model
100CB[3]
Accurate?
OEM
CEE[3]
Accurate?
Machine type
Table Top Spinner/Hotplate[1]
Accurate?
Machine type
Bench Mounted Spinner/Hotplate[2]
Accurate?
Spin speed
Up to 5000 rpm[1]
Accurate?
Process steps
Programmable with up to 10 process steps[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
CEE 100CB Table Top Spinner/HotplateTable-top configuration; mounted in an exhausted custom hood.nanofab.ece.cmu.edu[1]
CEE 100CB Bench Mounted Spinner/HotplateBench-mounted configuration; mounted in an exhausted wet bench.nanofab.ece.cmu.edu[2]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Photoresist compatibilityStandard positive photoresists only[1]
  • HotplateProgrammable vacuum hotplate for baking photoresist[1]
  • MountingMounted in an exhausted custom hood[1]
  • MountingMounted in an exhausted wet bench[2]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the 100CB are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 100CB are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the 100CB are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 100CB are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 100CB is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the 100CB are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]nanofab.ece.cmu.edunanofab.ece.cmu.edunanofab.ece.cmu.edu
  2. [2]nanofab.ece.cmu.edunanofab.ece.cmu.edunanofab.ece.cmu.edu
  3. [3]nanofab.ece.cmu.edunanofab.ece.cmu.edunanofab.ece.cmu.edu
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Last updated Jul 29, 2026.