SUSS MicroTec
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The SUSS MicroTec Delta 12 AQ is an automated photoresist developer station.[2]
The Delta 12 AQ supports temperature controlled spray photoresist development.[2]
The Delta 12 AQ provides cassette-to-cassette substrate operation for a "dry in – dry out" process.[2]
The SUSS Delta 12 AQ is a machine that processes a variety of substrates using standard developer chemistries.[2]
The Delta 12 AQ performs photoresist development after optical exposure.[2]
The Delta 12 AQ handles substrates with a maximum diameter of 200 mm (8 in) and a maximum substrate thickness of 5 mm.[2]
The Delta 12 AQ supports wafer diameters of 50 mm (2 in), 75 mm (3 in), 100 mm (4 in), 150 mm (6 in), and 200 mm (8 in).[2]
The Delta 12 AQ supports photomask sizes of 125 mm x 125 mm and 150 mm x 150 mm.[2]
The SUSS MicroTec Delta 12 AQ is used for photoresist development after optical exposure.[2]
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The following facts about the Delta 12 AQ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Delta 12 AQ are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Delta 12 AQ are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Delta 12 AQ are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Delta 12 AQ are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Delta 12 AQ is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Aug 24, 2026.