SUSS MicroTec
ACS 200 Gen 3
Plate 01Coater developer (Suss ACS200Gen3) at uSIC, Tohoku University
Micro System Integration Center(uSIC), Tohoku UnivWatch on YouTube
What it is
General reference — not yet source-verifiedThe SUSS MicroTec ACS 200 Gen 3 is an automated coater and developer platform used in lithography. Coater and developer tools prepare wafers with photoresist and then develop the exposed resist pattern as part of the wafer patterning sequence.
How it works
The SUSS ACS 200 Gen 3 can be configured with a dual-arm wafer transfer system and a pre-aligner that rotates wafers to their flat or notch orientation for opaque silicon wafers and transparent glass wafers. The SUSS ACS 200 Gen 3 can also include 8 bake plates with proximity-bake support and 3 cool plates with proximity support.[1]
Where it fits in the process flow
General reference — not yet source-verifiedCoater and developer equipment sits around the exposure step in photolithography. Such tools are used before exposure to apply resist and perform associated thermal conditioning, and after exposure to develop the latent image so the patterned resist can guide later etch, implantation, plating, or lift-off steps.
Applications
General reference — not yet source-verifiedCoater and developer platforms are used wherever patterned photoresist is needed on wafer substrates. Typical applications include semiconductor device fabrication, packaging, microsystems work, and process development on substrates such as silicon and glass.
What do the numbers mean?
Power & electrical2
Wafer handling8
- Pre-Aligner
- Equipped with Orientation flat/notch postition rotation for both opague (Si water) & transparent (glass water)substrates[1]
- Pre-Aligner
- Equipped with Orientation flat/notch position rotation for both opaque & transparent substrates[1]
- Pre-aligner
- Equipped with orientation flat/notch postition rotation for both opaque (Si water) and transparent (glass water) substrates[1]
Gas & chemistry9
- 4 developers[5]
- Coaters & Developers Vintage
- 2019(inventory listing)
- Coaters & Developers Vintage
- 2022(inventory listing)
- Coaters & Developers Vintage
- 2013(inventory listing)
- Coaters & Developers Vintage
- 2021(inventory listing)
- Coaters & Developers Vintage
- 2018(inventory listing)
- Coater / Developer[5]
Configuration & options20
- Bake Plate (8):[1]
- Supports Proximity Bake[1]
- Cool Plate (3):[1]
- Proximity supported[1]
- Configured with a 4D setup[5]
- New monitor[5]
- No keyboard[5]
- Vintage
- 2019(inventory listing)
- Vintage
- 2022(inventory listing)
- Vintage
- 2013(inventory listing)
- Vintage
- 2021(inventory listing)
- Vintage
- 2018(inventory listing)
- - # of develop line each bowl
- 2:DEV (binary , fan spray), 2: DI (binary, fan spray), 1:N2(inventory listing)
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| ACS 200 Gen 3 Coater/Developer | Gen 3 | 2017 | Configured as a coater/developer system with 4 developers and a 4D setup | Equipment inventory listing[5] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Set-up Transformer50 Hz Compatible Model[1]
- Configuration4 developers[5]
- Coaters & Developers Vintage2019
- Coaters & Developers Vintage2022
- Coaters & Developers Vintage2013
- Coaters & Developers Vintage2021
- Coaters & Developers Vintage2018
- Configuration (variant)Coater/Developer with 4 developers, 4D setup[5]
- ConfigurationCoater / Developer[5]
- Developers4 developers[5]
- Transformer50 Hz compatible model[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the role of photoresist in this class of machine?General reference — not yet source-verified
Photoresist is the light-sensitive film that receives the pattern. Exposure changes its chemical behavior, allowing selective development of the desired image.
Why is alignment important for lithography equipment?General reference — not yet source-verified
Alignment ensures that each new pattern lands in the correct position relative to previously formed structures, which is essential for multilayer device fabrication.
Not publicly documented
The following facts about the ACS 200 Gen 3 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the ACS 200 Gen 3 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the ACS 200 Gen 3 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the ACS 200 Gen 3 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the ACS 200 Gen 3 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the ACS 200 Gen 3 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (6)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Inventory photo
- [4]Inventory photo
- [5]inventory listing
- [6]XB8 Permanent Bonder | SUSS — suss.com (Nov 13, 2024)web.archive.org
Last updated Oct 20, 2026.
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