Brewer Science
Brewer Science CEE 200 XD Spay / Puddle Developer is a developer system. Brewer Science CEE 200 XD Spay / Puddle Developer includes a heated hotplate. Brewer Science CEE 200 XD Spay / Puddle Developer operates on 110-125 V, 1 phase, 50/60 Hz.[1]

The Brewer Science CEE 200 XD is a spray and puddle developer for resist processing. The Brewer Science CEE 200 XD is configured with a heated hotplate, a chemical delivery and control chassis, and a multi-channel power supply. The Brewer Science CEE 200 XD operates from 110–125 V, single-phase, at 50/60 Hz. The Brewer Science CEE 200 XD has a full-load current of 5.6 A, a power rating of 655 W, and a 15 A input breaker or fuse with 10000 interrupt capacity.[1]
The Brewer Science CEE 200 XD includes a chemical delivery and control chassis. The Brewer Science CEE 200 XD also includes a heated hotplate and a multi-channel power supply.[1]
Resist development takes place after photoresist coating, soft bake, and pattern exposure. The development step reveals the latent image in the resist so that subsequent inspection, etch, implantation, plating, or lift-off steps can act on the patterned wafer. A resist processing developer therefore sits in the lithography flow between exposure and the transfer of the resist pattern into underlying materials.
Spray and puddle developers are used for patterned photoresist processing in microfabrication and related wafer-level work. Typical uses include creating resist masks for subtractive pattern transfer, defining openings for additive deposition processes, and preparing patterned layers for inspection and further fabrication. Tools in this class are applicable wherever a developed resist image is needed as an intermediate patterning layer.
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The Brewer Science CEE 200 XD is a spray and puddle developer for resist processing.[1]
The Brewer Science CEE 200 XD operates on 110–125 V, single-phase, at 50/60 Hz.[1]
The Brewer Science CEE 200 XD has a full-load current of 5.6 A and a power rating of 655 W.[1]
The following facts about the CEE 200 XD Spay Puddle are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CEE 200 XD Spay Puddle are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the CEE 200 XD Spay Puddle are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the CEE 200 XD Spay Puddle are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the CEE 200 XD Spay Puddle are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the CEE 200 XD Spay Puddle is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 16, 2026.
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