Edwards
The Edwards iH1000 is a dry vacuum pumping system that uses an HCDP80 dry pump with an HCMB1000 mechanical booster pump, achieving a peak pumping speed of 1000 m³/h at 60 Hz. The iH1000 is part of the iH series of dry pumping systems from Edwards (formerly BOC Edwards).[1]

A dry vacuum pumping system is a support tool that creates vacuum for process equipment without using sealing oil in the pumped gas path. Dry vacuum pumps in semiconductor service are commonly installed beside or beneath process tools to evacuate chambers, transfer spaces, and load interfaces.
Dry vacuum pumps of this class sit in the subfab or equipment support layer rather than at the wafer handling front end. Process tools connect their vacuum chambers or transfer volumes to the pump inlet, and the pump exhaust connects onward to facility exhaust treatment or abatement infrastructure.
Dry pumps in this category are used wherever a process tool needs clean rough vacuum generation and stable chamber evacuation. Dry pumps in harsh process service are commonly paired with deposition, etch, implant, and transfer functions that generate reactive gases, condensable species, or particulate loads.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| IH 1000 Pump - Without Invrt - Fully refurbished | — | — | Described as without inverter and fully refurbished. | Equipment inventory listing[4] |
| IH 1000 Pump - With Invrt | — | — | Described as with inverter. | Equipment inventory listing[2] |
| IH 1000 Pump - Rear | — | — | Described as rear. | Equipment inventory listing[3] |
| iH1000F | — | — | Includes Breach Sensor for leak detection during run 'til crash. | nanofab.utah.edu[1] |
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The IH 1000 combines an HCDP dry pump with an HCMB mechanical booster pump. The HCMB booster is fitted on the iH600 and iH1000 systems only.[1]
The IH 1000 requires a nitrogen supply, cooling-water connections, and an electrical supply. Optional accessories include an enclosure extraction fan and alternative nitrogen and cooling-water connection kits.[1]
The iH dry pumping systems are declared compliant with the ATEX directive as Category 3GD equipment for internal atmospheres only.[1]
Maintenance includes checking and changing the oil in the HCDP pump and the HCMB pump on iH600 and iH1000 systems. Maintenance also includes checking purge-gas flow rates, inspecting and cleaning the exhaust pipe, and zeroing the gas-module flow transducer.[1]
The following facts about the IH 1000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the IH 1000 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the IH 1000 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the IH 1000 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the IH 1000 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the IH 1000 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 21, 2026.
The Applied Materials 0010-13627 is a high efficiency RF match designed for semiconductor equipment.
General referenceThe Applied Materials 0015 20064 Part is an identified component within the lab and support equipment category, used in a supporting role around semiconductor manufacturing and processing tools.