KLA
1501
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The KLA 1501 is a thermocouple instrumented wafer for temperature measurement in semiconductor manufacturing. The KLA 1501 is used for RTP pyrometer calibration. The KLA 1501 was introduced in 1987.[1][2]
What it is
The KLA 1501 is a thermocouple instrumented wafer used for temperature measurement and pyrometer calibration in rapid thermal processing systems. The KLA 1501 is also referred to as the Process Probe 1501.[2][1]
How it works
The KLA 1501 uses embedded thermocouple sensors in a silicon wafer substrate to measure wafer temperature. The KLA 1501 was introduced in 1987. The KLA 1501 was used by many customers as a reference for temperature calibration in RTP systems. The KLA 1501 design used a thermocouple junction with limited embedding in the wafer, and that structure made the reading sensitive to the temperature of thermocouple wire above the wafer. The KLA 1501 was typically fabricated with from 1 to 34 thermocouple sensors. The KLA 1501 used Type-K or Type-R thermocouple wire. The KLA 1501 used 0.005 inch thermocouple wire. The KLA 1501 used braided silica sleeving or micro quartz tubing for wire insulation. The KLA 1501 wafer substrate was silicon with p-boron doping, (1-0-0) orientation, and minimum thickness of 525 micrometers.[2][1]
Where it fits in the process flow
Applications
The KLA 1501 is used for wafer temperature measurement in the semiconductor industry. The KLA 1501 is used for RTP pyrometer calibration. The KLA 1501 was used in cold wall processing systems, where vertical thermal gradients or heat flux above the wafer could influence measured temperature. The KLA 1501 was sensitive to such conditions, and the temperature offset between the 1501 and the later 1530 in RTP could reach up to 20 degrees Celsius at 1100 degrees Celsius.[2][1]
Why won't it start?
Documented failure modes, common issues, and field considerations.
- The 1501 is described as having lower wafer-to-wafer matching and repeatability than the 1530.
- The 1501 is described as being sensitive to temperature gradients in the wire above the wafer and gradients in the cement bond area.
- The 1501 is described as being phased out for cold-wall applications.
- The 1501 is described as having run-to-run variability in calibration temperature from installation effects.
What do the numbers mean?
Wafer handling4
Configuration & options7
- thermocouple wire type
- Type-K (Chromel-Alumel) or Type-R (Platinum - Platinum, 13% Rhodium)[1]
Vintage & configurations
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the KLA 1501 used for?
The KLA 1501 is a thermocouple instrumented wafer used for wafer temperature measurement and for RTP pyrometer calibration in rapid thermal processing systems.[2][1]
How are temperature sensors implemented in the KLA 1501?
The KLA 1501 uses embedded thermocouple sensors in a silicon wafer substrate. The KLA 1501 typically has from 1 to 34 thermocouple sensors and uses Type-K or Type-R thermocouple wire.[2][1]
Why was the KLA 1501 replaced in many RTP applications?
The KLA 1501 was replaced by the 1530 because the older 1501 design was more sensitive to the temperature of thermocouple wire above the wafer, which reduced accuracy and repeatability. The 1530 was developed with improved sensor embedding and delivered more than a factor of 4 improvement in wafer to wafer matching and repeatability.[2][1]
What calibration shift can occur when changing from the KLA 1501 to the 1530 in RTP?
A shift in indicated temperature can occur when converting from the 1501 to the 1530. In RTP, an offset of up to 20 degrees Celsius at 1100 degrees Celsius was measured, with the 1530 typically indicating a higher temperature than the 1501 under similar conditions.[2][1]
Not publicly documented
The following facts about the 1501 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the 1501 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 1501 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 1501 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 1501 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the 1501 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]datasheet.datasheetarchive.com — datasheet.datasheetarchive.comdatasheet.datasheetarchive.com
- [2]nanofab.utah.edu — nanofab.utah.edunanofab.utah.edu
- [3]nanofab.utah.edu — nanofab.utah.edunanofab.utah.edu
Last updated Oct 19, 2026.
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