KLA
FT 750
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The KLA FT 750 is a visible-light spectrophotometer. The KLA FT 750 is used for CVD, etch, lithography, diffusion, and other processes. The KLA FT 750 includes reflectivity mapping and optional gamma curve plotting for lithographic process optimization.[1]
What it is
The KLA FT 750 is a thin film measurement system. The KLA FT 750 is also referred to as the Prometrix FT-750. The KLA FT 750 uses visible light spectrophotometer technology. The KLA FT 750 is used for measurements associated with CVD, etch, lithography, diffusion, and other processes.[1]
How it works
The KLA FT 750 uses visible light spectrophotometer technology to produce measurements. The KLA FT 750 uses advanced measurement algorithms that account for film dispersion, underlying film thickness, and differing numerical apertures. The KLA FT 750 has reflectivity mapping capability. The KLA FT 750 can be configured with optional gamma curve plotting.[1]
Where it fits in the process flow
General reference — not yet source-verifiedThin film metrology tools sit alongside deposition, patterning, and film modification steps in wafer fabrication. Thin film metrology tools are typically used after a process step to verify whether the resulting film behavior remains within process targets. Thin film metrology tools feed measurements back to process engineering for adjustment of upstream modules and recipes.
Applications
The KLA FT 750 provides measurements for CVD, etch, lithography, diffusion, and other processes. The KLA FT 750 can optimize lithographic processes through reflectivity mapping combined with optional gamma curve plotting. The KLA FT 750 automatically determines the contrast and sensitivity of virtually any photoresist when used with the optional gamma curve plotting capability.[1]
What do the numbers mean?
Gas & chemistry3
- Use in lithography
- optimizes lithographic processes by automatically determining the contrast and sensitivity of virtually any photoresist[1]
Optics & imaging1
- Measurement features
- advanced measurement algorithms account for film dispersion, underlying film thickness, and differing numerical apertures[1]
Control & software2
Configuration & options8
- Process optimization features
- reflectivity mapping capability with optional gamma curve plotting[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What measurement technology does the FT 750 use?
The FT 750 uses visible-light spectrophotometer technology.[1]
Which processes does the FT 750 support?
The FT 750 is used for CVD, etch, lithography, diffusion, and other processes.[1]
What film-related effects do the FT 750 algorithms account for?
The FT 750 algorithms account for film dispersion, underlying film thickness, and differing numerical apertures.[1]
What does the FT 750 help determine for photoresist?
The FT 750 automatically determines the contrast and sensitivity of virtually any photoresist.[1]
Not publicly documented
The following facts about the FT 750 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FT 750 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the FT 750 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the FT 750 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the FT 750 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the FT 750 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]web.archive.org — tencor.com (Apr 22, 1999)web.archive.org
- [2]inventory listing
Last updated Oct 18, 2026.
Compare with similar tools
View all →Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The Ultratech 1000 Family is a photolithography step-and-repeat 1X steppers family using the Wynne Dyson optical design.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
