KLA
SM 300
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
The SpectraMap Auto SM300 utilizes a reflected intensity technique for automated film thickness mapping. The SpectraMap Auto SM300 measures dielectric films and resists on monitor wafers. The SpectraMap Auto SM300 measures a wide range of thicknesses and film types.[3]
Where it fits in the process flow
General reference — not yet source-verifiedFilm-thickness mapping tools sit in the process-control flow around coating, deposition, and pattern-transfer modules. Monitor wafers commonly move from a process tool to metrology so engineers can verify thickness behavior and wafer-level uniformity before further processing. Thickness mapping results are commonly used to check whether a process is centered and stable before product wafers continue downstream.
Applications
The SpectraMap Auto SM300 characterizes photoresist track systems, CVD equipment, and etch equipment. The SpectraMap Auto SM300 measures dielectric films and resists on monitor wafers. The SpectraMap Auto SM300 uses its speed and mapping capabilities to allow immediate troubleshooting of equipment and process parameters.[3]
What do the numbers mean?
Gas & chemistry1
Configuration & options4
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Gasno chemicals[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the KLA SM 300?
The KLA SM 300 is semiconductor manufacturing equipment made by KLA. The KLA-Tencor product name for the tool is SpectraMap Auto SM300.[2][3]
What measurement technique does the SM 300 use?
The SpectraMap Auto SM300 utilizes a reflected intensity technique for automated film thickness mapping of dielectric films and resists on monitor wafers.[3]
What kinds of process areas does the SM 300 support?
The SpectraMap Auto SM300 characterizes photoresist track systems, CVD equipment, and etch equipment.[3]
Not publicly documented
The following facts about the SM 300 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SM 300 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SM 300 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SM 300 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the SM 300 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the SM 300 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]KLA-Tencor Web Site Products - Film Measurement - Product — tencor.com (Apr 22, 1999)web.archive.org
Last updated Oct 19, 2026.
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