Laurell

Wafer size
300mm
Power
95 to 240VAC, 47/63HZ, ~300 Watts[1]
Process applications and technology nodes documented for this tool.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| WS-650-15 B | 650-series | — | Described as the station-mounted WS-650-15 B spin coater. | web.archive.org[1] |
| WS-650-15B | 650-series | — | Described as the station-mounted WS-650-15B spin coater. | web.archive.org[2] |
| WS-650-15 B | 650-series | — | Described as the station-mounted WS-650-15 B spin coater. | web.archive.org[3] |
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
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The following facts about the WS-650-15 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the WS-650-15 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the WS-650-15 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the WS-650-15 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the WS-650-15 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the WS-650-15 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Last updated Jul 29, 2026.
The Laurell EDC-HL-15 B is a 650-series EDC spin processor that accommodates up to 300 mm wafers and 9" × 9" substrates.
The Laurell H6-15 is a compact HL Series spin coater designed for glove box use and specified to accommodate up to ø 300mm wafers and 9" × 9" substrates.
Laurell's WS-400-6NPP is a 400-series spin coater with a 400-series process controller, a 1.75" vacuum chuck, and support for wafers up to 150 mm.
The Laurell EDC-HL-23 B is a compact EDC spin processor with capacity for up to 150 mm wafers and 5 in x 5 in substrates.