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MetaPulse 200 Metal Film Measurement
How it works
The MetaPulse 200 uses picosecond ultrasonic laser sonar and a non-contact, non-destructive measurement method. The MetaPulse 200 can measure single or multi-layer thicknesses on product wafers and can use pattern recognition to place a measurement spot on existing metrology sites.[3]
Where it fits in the process flow
The MetaPulse 200 is used on product wafers and can reduce reliance on monitor wafers in controlling multilayer metal deposition. The MetaPulse 200 is also positioned to diagnose film adhesion and interlayer reaction problems and to measure roughness and material properties tied to the film stack.[3]
Applications
The MetaPulse 200 measures opaque film stacks. The MetaPulse 200 can measure up to six layers in a multilayer metal film stack.[3]
What do the numbers mean?
Power & electrical1
- Configuration description
- Pattern Recognition; 200 mm ergonomic cassette-tilt loaders; Pulse Wafer Transport System; 200 mm chuck; 200 mm wafer probe; 200 mm linear positioning stage; Ultrafast 800 nm laser; Programmable motion controller; Color printer (cleanroom approved); 266 MHz Pentium II Motherboard; 2 GB hard drive; CD ROM drive; LCD screen; Keyboard and Trackball; GEM compliant SECS-II[2]
Vacuum & pumping5
Wafer handling6
- 6" Chuck[1]
Optics & imaging2
- Measurement technique
- Picosecond ultrasonic laser sonar (PULSE Technology), non-contact, non-destructive measurement based on laser-induced ultrasound[3]
Performance2
Dimensions & facilities5
- Cooling water requirement
- Minimum flow 0.79 GPM (3.00 l/m); minimum temperature 12°C; maximum temperature 20°C[1]
Configuration & options14
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationOperating Air Pressure 14.00 PSI (96,534.20 N/sq m)[1]
- ConfigurationVacuum Required 0.98 in Hg (24.89 mm Hg)[1]
- Operating air pressure14.00 PSI (96,534.20 N/sq m)[1]
- Vacuum required0.98 in Hg (24.89 mm Hg)[1]
- Configuration descriptionPattern Recognition; 200 mm ergonomic cassette-tilt loaders; Pulse Wafer Transport System; 200 mm chuck; 200 mm wafer probe; 200 mm linear positioning stage; Ultrafast 800 nm laser; Programmable motion controller; Color printer (cleanroom approved); 266 MHz Pentium II Motherboard; 2 GB hard drive; CD ROM drive; LCD screen; Keyboard and Trackball; GEM compliant SECS-II[2]
- Vacuum requirement0.98 in Hg (24.89 mm Hg)[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What does the MetaPulse 200 measure?
The MetaPulse 200 measures opaque films on product wafers. The MetaPulse 200 can measure single-layer thicknesses and can simultaneously measure the individual thicknesses of up to six layers in a multi-layer metal film stack.[3]
What measurement method does the MetaPulse 200 use?
The MetaPulse 200 uses picosecond ultrasonic laser sonar, called PULSE Technology. The MetaPulse 200 uses a non-contact, non-destructive measurement technique based on laser-induced ultrasound.[3]
How precisely can the MetaPulse 200 place its measurement spot?
The MetaPulse 200 uses pattern recognition to place its 10 µm measurement spot within existing metrology sites for on-product measurement.[3]
Not publicly documented
The following facts about the MetaPulse 200 Metal Film Measurement are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MetaPulse 200 Metal Film Measurement are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MetaPulse 200 Metal Film Measurement are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MetaPulse 200 Metal Film Measurement are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MetaPulse 200 Metal Film Measurement are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MetaPulse 200 Metal Film Measurement is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]rawbw.comrawbw.com
- [3]semiconductoronline.com — semiconductoronline.comsemiconductoronline.com
Last updated Oct 19, 2026.
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