Semitool
880 SRD
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Semitool 880 SRD is a spin rinse dryer. The Semitool 880 SRD is categorized under Wet Processing / Clean. The Semitool 880 SRD has a Left - Right Door configuration.[1][2]
What it is
How it works
General reference — not yet source-verifiedA spin rinse dryer combines liquid rinse handling with rotational drying to remove process fluids from handled parts after wet steps.
A spin rinse dryer uses centrifugal action during rotation to assist liquid removal from surfaces before the parts move to the next step.
Where it fits in the process flow
The Semitool 880 SRD sits in the wet processing and clean portion of the semiconductor flow.[2]
Applications
What do the numbers mean?
Configuration & options7
- Left - Right Door[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the primary purpose of a spin-rinse-dryer in semiconductor manufacturing?General reference — not yet source-verified
The primary purpose is to remove chemical residues and moisture from wafers after wet processing, delivering a clean, dry surface ready for subsequent fabrication steps.
How does an SRD prevent particle contamination during drying?General reference — not yet source-verified
By using high-speed rotation and filtered gases, SRDs minimize the risk of particle redeposition. The sealed chamber and controlled environment further reduce airborne contaminants.
Can an SRD process multiple wafers simultaneously?General reference — not yet source-verified
Yes, many spin-rinse-dryers are designed to handle batches of wafers in a single cycle, although the exact batch size varies by model and configuration.
What types of fluids are typically used in an SRD?General reference — not yet source-verified
Deionized water is the most common rinse fluid, sometimes combined with isopropyl alcohol or other additives to enhance drying and reduce surface tension.
Not publicly documented
The following facts about the 880 SRD are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 880 SRD are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 880 SRD are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 880 SRD are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 880 SRD are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 880 SRD is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Inventory photo
Last updated Oct 13, 2026.
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