Tokyo Electron
Lithius Pro
The Tokyo Electron LITHIUS Pro is a 300mm wafer coater-developer for semiconductor lithography. The LITHIUS Pro supports ArF immersion, ArF, KrF, and i-line lithography processes. The LITHIUS Pro V variant achieves a maximum throughput of 250 wph.[1][2][3]
Performance
200 wph (upgradeable to 250 wph)[1]
Gas delivery
Coater / Developer[4]
Optics
With Rinse process at pre-/post exposure[4]
What it is
General reference — not yet source-verifiedA coater-developer prepares wafers for optical pattern transfer by applying photoresist and then developing the exposed resist image after the exposure step. The equipment class is part of the lithography cell and is commonly integrated in line with exposure tools and supporting wafer handling.
How it works
General reference — not yet source-verifiedLithography tools of this class move wafers through a sequence of coating, bake, chill, develop, rinse, and transfer functions under automated handling. The process flow is organized around resist application before exposure and chemical development after exposure, with modules arranged to support repeatable wafer-to-wafer processing.
Where it fits in the process flow
General reference — not yet source-verifiedA coater-developer sits within the lithography sequence between wafer preparation and pattern transfer. The tool coats wafers with photoresist before exposure, and after exposure the tool develops the resist so the patterned image can guide later process steps such as etch or implantation.
Applications
General reference — not yet source-verifiedCoater-developers are used wherever patterned photoresist is needed on semiconductor wafers. Typical uses include forming resist images for device features, interconnect levels, contact structures, and other patterned layers that will be transferred by subsequent fabrication steps.
What do the numbers mean?
Wafer handling1
Gas & chemistry2
Optics & imaging4
Performance2
- Throughput
- Maximum 250 wph capable in future; 200 wph capability with future upgradeability to 250 wph[1]
Control & software1
Configuration & options25
- Immersion COT and DEV[4]
- 1 Foup exchanger[4]
- 3BCT[4]
- 3COT[4]
- 3ITC[4]
- 6DEV[4]
- 3ADH[4]
- 12CGHA,[4]
- 6CPHP[4]
- 6CEHP,[4]
- 6CGHP[4]
- 3BST[4]
- 3PIR[4]
- 2WIS[4]
- 4SCPL[4]
- 6CPL[4]
- 2WEE[4]
Vintage & configurations
- 2025-12Announcement of LITHIUS Pro DICE[2]
TEL announced the new CLEAN TRACK LITHIUS Pro DICE in December 2025.
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| CLEAN TRACK LITHIUS Pro V | — | — | No differences from the base line stated in the source beyond the variant designation. | web.archive.org[1] |
| CLEAN TRACK LITHIUS Pro V-i | — | — | No differences from the base line stated in the source beyond the variant designation. | web.archive.org[1] |
| LITHIUS Pro V | — | — | High-productivity platform with 200 wph throughput upgradeable to 250 wph; optimized integration with exposure tool. | web.archive.org[1] |
| LITHIUS Pro V-i | — | — | Variation of LITHIUS Pro V; details not specified in sources. | web.archive.org[1] |
| LITHIUS Pro-i | — | — | Listed alongside LITHIUS Pro; likely a variant with i-line optimization. | web.archive.org[1] |
| LITHIUS Pro DICE | — | 2025 | Announced December 2025; features defect control technology reducing resist coating defects by 50% or more; world-class productivity; improved environmental performance. | tel.com[2] |
| LITHIUS Pro Z | — | — | Previous model provided for over a decade; preceded LITHIUS Pro DICE. | tel.com[2] |
| CLEAN TRACK LITHIUS Pro DICE | — | 2025 | A new 300mm wafer coater-developer with defect control technology and improved productivity and environmental performance. | tel.com[2] |
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- SUSS MicroTec ACS 200 +— Same function class: Lithography, nullCompare in depthsource[5]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer size does the LITHIUS Pro handle?
The LITHIUS Pro is configured for 300 mm wafers.[3]
Not publicly documented
The following facts about the Lithius Pro are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the Lithius Pro are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Lithius Pro are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Lithius Pro is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Lithius Pro are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the Lithius Pro are on record.
Answerable by: university cleanroom staff or an OEM application specialist
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]web.archive.org — tel.com (Oct 18, 2009)web.archive.org
- [2]tel.com — tel.comtel.com
- [3]macquarie.com — macquarie.commacquarie.com
- [4]Inventory photo
- [5]web.archive.orgweb.archive.org
Last updated Oct 19, 2026.
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