Quantum & Superconducting

The Laurell WS-650-23 is a station-mounted spin coater in the WS-650 series that accommodates up to ø 150 mm wafers and 5" × 5" substrates.

The Laurell EDC-HL-15 B is a 650-series EDC spin processor that accommodates up to 300 mm wafers and 9" × 9" substrates.

The Laurell EDC-HL-23 B is a compact EDC spin processor with capacity for up to 150 mm wafers and 5 in x 5 in substrates.

The Laurell H6-23 is a compact HL Series spin coater for wafers and substrates, with a maximum rotational speed of 12,000 RPM.

The Laurell WS-650-8B is a compact 650-series spin coater with a maximum rotational speed of 12,000 RPM and support for wafers up to 200 mm.

The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.

The Laurell SU-8 is a spin station dedicated to applying SU-8 photoresist for lithography processes.

The SUSS ACS200 GEN3 is a modular cluster tool for coating and development of i-line photoresists.

The Denton Vacuum EE-4 is an electron beam deposition tool with a 6-position hearth, a dual chamber design, automated pump-down/venting, and capacity for multiple wafer sizes.

The SPTS MVD100E is a Molecular Vapor Deposition system designated for R&D or pilot manufacturing.

The Oxford 100 Plus Nitride is a nitride deposition system made by Oxford.

The Denton SJ20C is an electron-beam evaporation tool used for physical vapor deposition of a wide range of materials.

The Applied Materials Centura Ultima+ HDP is a chemical vapor deposition system for 6-inch wafers, equipped with an ENI AM200 RF generator.

The SPTS CET25 is a 25-wafer batch process module for HF vapor release etch for MEMS.

The Oxford NGP80 RIE is a plasma etch system located in room W1-062.

The Applied Materials Centura I P 1 is an oxide etcher for 6-inch wafers.

The Oxford Plasmalab 100 ICP 380 is an etcher, as stated in the product listing.

The EVG 301 is a semi-automated single wafer cleaning system for R&D, featuring megasonic cleaning, spinner rotation up to 3000 rpm, and optional pre-bonding and IR-inspection modules.

The DISCO DCS1460 is an automatic cleaning system for Φ300 mm wafers used to clean workpieces that have been cut on a dicing saw.

The Ultratech 602 Plate Mask Cleaner is a cleaning tool designed for masks and plates in semiconductor manufacturing.

The Tokyo Electron Clean Track Lithius Pro V is a resist coater/developer for 12-inch wafers, described as a multi-block system.

The Agilent 11729C Carrier Noise Test Set is an integral part of a phase noise measurement system, capable of up-converting, down-converting, and phase/frequency demodulation.

The KLA 1007 is a wafer prober manufactured by KLA.

The Cascade Microtech 103-754 is an x-y-z-θ probe positioner used in the HFTL 50-GHz Small-Signal Probe Station.

The Electroglas 2001 CX Automatic Wafer Prober is an automatic wafer prober designed for wafer test and sort.

The FEI Nova 600i (also called Nova NanoLab 600i) is a DualBeam system combining a field emission scanning electron microscope (FESEM) with a gallium focused ion beam (Ga FIB) for nanoscale prototyping, machining, characterization, and analysis of structures below 100 nm.

The Leica DM2700 M is an upright materials microscope with universal white light LED illumination designed for routine inspection tasks in metallography, earth science, forensic investigation, and materials quality control and research.

The ZEISS Axioscope 5 is a smart upright microscope designed for biomedical routine and research, featuring automatic digital documentation with a Snap button and support for multiple contrast techniques.